The influence of sub-100 nm scattering on high-energy electron beam lithography Page: 11 of 21
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Figure 10. Measured (dots) and calculated (solid) linewidth versus dose for
60nm period lines.
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Anderson, Erik H.; Olynick, Deidre L.; Chao, Weilun; Harteneck, Bruce & Veklerov, Eugene. The influence of sub-100 nm scattering on high-energy electron beam lithography, article, August 1, 2001; Berkeley, California. (digital.library.unt.edu/ark:/67531/metadc740262/m1/11/: accessed February 20, 2019), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.