Anderson, Erik H.; Olynick, Deidre L.; Chao, Weilun; Harteneck, Bruce & Veklerov, Eugene. The influence of sub-100 nm scattering on high-energy electron beam lithography, article, August 1, 2001; (https://digital.library.unt.edu/ark:/67531/metadc740262/m1/1/: accessed July 16, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; .