Development of a Silicon Based Electron Beam Transmission Window for Use in a KrF Excimer Laser System

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The Princeton Plasma Physics Laboratory (PPPL), in collaboration with the Naval Research Laboratory (NRL), is currently investigating various novel materials (single crystal silicon, <100>, <110> and <111>) for use as electron-beam transmission windows in a KrF excimer laser system. The primary function of the window is to isolate the active medium (excimer gas) from the excitation mechanism (field-emission diodes). Chosen window geometry must accommodate electron energy transfer greater than 80% (750 keV), while maintaining structural integrity during mechanical load (1.3 to 2.0 atm base pressure differential, approximate 0.5 atm cyclic pressure amplitude, 5 Hz repetition rate) and thermal load across ... continued below

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765 Kilobytes pages

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Gentile, C.A.; Fan, H.M.; Hartfield, J.W.; Hawryluk, R.J.; Hegeler, F.; Heitzenroeder, P.J. et al. November 21, 2002.

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Description

The Princeton Plasma Physics Laboratory (PPPL), in collaboration with the Naval Research Laboratory (NRL), is currently investigating various novel materials (single crystal silicon, <100>, <110> and <111>) for use as electron-beam transmission windows in a KrF excimer laser system. The primary function of the window is to isolate the active medium (excimer gas) from the excitation mechanism (field-emission diodes). Chosen window geometry must accommodate electron energy transfer greater than 80% (750 keV), while maintaining structural integrity during mechanical load (1.3 to 2.0 atm base pressure differential, approximate 0.5 atm cyclic pressure amplitude, 5 Hz repetition rate) and thermal load across the entire hibachi area (approximate 0.9 W {center_dot} cm superscript ''-2''). In addition, the window must be chemically resistant to attack by fluorine free-radicals (hydrofluoric acid, secondary). In accordance with these structural, functional, and operational parameters, a 22.4 mm square silicon prototype window, coated with 500 nm thin-film silicon nitride (Si{sub 3}N{sub 4}), has been fabricated. The window consists of 81 square panes with a thickness of 0.019 mm {+-} 0.001 mm. Stiffened (orthogonal) sections are 0.065 mm in width and 0.500 mm thick (approximate). Appended drawing (Figure 1) depicts the window configuration. Assessment of silicon (and silicon nitride) material properties and CAD modeling and analysis of the window design suggest that silicon may be a viable solution to inherent parameters and constraints.

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765 Kilobytes pages

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INIS; OSTI as DE00809931

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  • Other Information: PBD: 21 Nov 2002

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  • Report No.: PPPL-3760
  • Grant Number: AC02-76CHO3073
  • DOI: 10.2172/809931 | External Link
  • Office of Scientific & Technical Information Report Number: 809931
  • Archival Resource Key: ark:/67531/metadc739983

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  • November 21, 2002

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  • Oct. 18, 2015, 6:40 p.m.

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  • April 15, 2016, 8:36 p.m.

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Gentile, C.A.; Fan, H.M.; Hartfield, J.W.; Hawryluk, R.J.; Hegeler, F.; Heitzenroeder, P.J. et al. Development of a Silicon Based Electron Beam Transmission Window for Use in a KrF Excimer Laser System, report, November 21, 2002; Princeton, New Jersey. (digital.library.unt.edu/ark:/67531/metadc739983/: accessed September 24, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.