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Contamination due to memory effects in filtered vacuum arc plasma deposition systems

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Thin film synthesis by filtered vacuum arc plasma deposition is a widely used technique with a number of important emerging technological applications. A characteristic feature of the method is that during the deposition process not only is the substrate coated by the plasma, but the plasma gun itself and the magnetic field coil and/or vacuum vessel section constituting the macroparticle filter are also coated to some extent. If then the plasma gun cathode is changed to a new element, there can be a contamination of the subsequent film deposition by sputtering from various parts of the system of the previous ... continued below

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Martins, D.R.; Salvadori, M.C.; Verdonck, P. & Brown, I.G. August 13, 2002.

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Thin film synthesis by filtered vacuum arc plasma deposition is a widely used technique with a number of important emerging technological applications. A characteristic feature of the method is that during the deposition process not only is the substrate coated by the plasma, but the plasma gun itself and the magnetic field coil and/or vacuum vessel section constituting the macroparticle filter are also coated to some extent. If then the plasma gun cathode is changed to a new element, there can be a contamination of the subsequent film deposition by sputtering from various parts of the system of the previous coating species. We have experimentally explored this effect and compared our results with theoretical estimates of sputtering from the SRIM (Stopping and Range of Ions in Matter) code. We find film contamination of order 10-4 - 10-3, and the memory of the prior history of the deposition hardware can be relatively long-lasting.

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  • Journal Name: Applied Physics Letters; Journal Volume: 8; Journal Issue: 11; Other Information: Journal Publication Date: Sept. 9, 2002

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  • Report No.: LBNL--51305
  • Grant Number: AC03-76SF00098
  • Office of Scientific & Technical Information Report Number: 806119
  • Archival Resource Key: ark:/67531/metadc739961

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

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  • August 13, 2002

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  • Oct. 18, 2015, 6:40 p.m.

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  • April 4, 2016, 3:02 p.m.

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Martins, D.R.; Salvadori, M.C.; Verdonck, P. & Brown, I.G. Contamination due to memory effects in filtered vacuum arc plasma deposition systems, article, August 13, 2002; Berkeley, California. (digital.library.unt.edu/ark:/67531/metadc739961/: accessed January 23, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.