Influence of Base Pressure on FeMn Exchange Biased Spin-Valve Films Metadata
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Title
- Main Title Influence of Base Pressure on FeMn Exchange Biased Spin-Valve Films
Creator
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Author: Mao, M.Creator Type: Personal
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Author: Cerjan, C.Creator Type: Personal
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Author: Law, B.Creator Type: Personal
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Author: Grabner, F.Creator Type: Personal
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Author: Vaidya, S.Creator Type: Personal
Contributor
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Sponsor: United States. Department of Energy. Office of the Assistant Secretary for Defense Programs.Contributor Type: OrganizationContributor Info: USDOE Office of Defense Programs (DP) (United States)
Publisher
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Name: Lawrence Livermore National LaboratoryPlace of Publication: CaliforniaAdditional Info: Lawrence Livermore National Lab., CA (United States)
Date
- Creation: 1999-08-13
Language
- English
Description
- Content Description: Spin-valve films of structure NiFeCo/Co/Cu/NiFeCo(Co)/FeMn/Cu were deposited on Si substrates by DC planetary magnetron sputtering techniques. The influence of base pressure, P{sub b}, on spin-valve properties was studied by varying P{sub b} over two decades from 3 x 10{sup -8} to 7 x 10{sup -6} Torr. The GMR ratio show a slight increase with increasing P{sub b} until a large decrease occurs at P{sub b} > 3.3 x 10{sup -6} Torr. Exchange bias field and blocking temperature remain constant in the base pressure range between 3 x 10{sup -8} and 5 x 10{sup -7} Torr before a large reduction begins. An upper bound base pressure, {sup u}P{sub b} {approx} 5 x 10{sup -7} Torr, is noted from the data, above which significant performance modification begins. The degradation in exchange bias field and blocking temperature, in particular, in spin-valve films using a NiFeCo pinned layer, is the result of deterioration in the crystallographic texture and can be understood due to the contamination both at the ferromagnetic/antiferromagnetic interface and in the bulk of FeMn layer.
- Physical Description: 703 Kilobytes pages
Subject
- Keyword: Modifications
- Keyword: Magnetrons
- STI Subject Categories: 36 Materials Science
- Keyword: Magnetism
- Keyword: Contamination
- Keyword: Magnetic Materials
- Keyword: Sputtering
- Keyword: Texture
- Keyword: Performance
- Keyword: Substrates
Source
- Conference: 44th Annual Conference on Magnetism and Magnetic Materials, San Jose, CA (US), 11/15/1999--11/18/1999
Collection
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Name: Office of Scientific & Technical Information Technical ReportsCode: OSTI
Institution
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Name: UNT Libraries Government Documents DepartmentCode: UNTGD
Resource Type
- Article
Format
- Text
Identifier
- Report No.: UCRL-JC-134296
- Grant Number: W-7405-Eng-48
- Office of Scientific & Technical Information Report Number: 792014
- Archival Resource Key: ark:/67531/metadc738349