Influence of Base Pressure on FeMn Exchange Biased Spin-Valve Films Metadata

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Title

  • Main Title Influence of Base Pressure on FeMn Exchange Biased Spin-Valve Films

Creator

  • Author: Mao, M.
    Creator Type: Personal
  • Author: Cerjan, C.
    Creator Type: Personal
  • Author: Law, B.
    Creator Type: Personal
  • Author: Grabner, F.
    Creator Type: Personal
  • Author: Vaidya, S.
    Creator Type: Personal

Contributor

  • Sponsor: United States. Department of Energy. Office of the Assistant Secretary for Defense Programs.
    Contributor Type: Organization
    Contributor Info: USDOE Office of Defense Programs (DP) (United States)

Publisher

  • Name: Lawrence Livermore National Laboratory
    Place of Publication: California
    Additional Info: Lawrence Livermore National Lab., CA (United States)

Date

  • Creation: 1999-08-13

Language

  • English

Description

  • Content Description: Spin-valve films of structure NiFeCo/Co/Cu/NiFeCo(Co)/FeMn/Cu were deposited on Si substrates by DC planetary magnetron sputtering techniques. The influence of base pressure, P{sub b}, on spin-valve properties was studied by varying P{sub b} over two decades from 3 x 10{sup -8} to 7 x 10{sup -6} Torr. The GMR ratio show a slight increase with increasing P{sub b} until a large decrease occurs at P{sub b} > 3.3 x 10{sup -6} Torr. Exchange bias field and blocking temperature remain constant in the base pressure range between 3 x 10{sup -8} and 5 x 10{sup -7} Torr before a large reduction begins. An upper bound base pressure, {sup u}P{sub b} {approx} 5 x 10{sup -7} Torr, is noted from the data, above which significant performance modification begins. The degradation in exchange bias field and blocking temperature, in particular, in spin-valve films using a NiFeCo pinned layer, is the result of deterioration in the crystallographic texture and can be understood due to the contamination both at the ferromagnetic/antiferromagnetic interface and in the bulk of FeMn layer.
  • Physical Description: 703 Kilobytes pages

Subject

  • Keyword: Modifications
  • Keyword: Magnetrons
  • STI Subject Categories: 36 Materials Science
  • Keyword: Magnetism
  • Keyword: Contamination
  • Keyword: Magnetic Materials
  • Keyword: Sputtering
  • Keyword: Texture
  • Keyword: Performance
  • Keyword: Substrates

Source

  • Conference: 44th Annual Conference on Magnetism and Magnetic Materials, San Jose, CA (US), 11/15/1999--11/18/1999

Collection

  • Name: Office of Scientific & Technical Information Technical Reports
    Code: OSTI

Institution

  • Name: UNT Libraries Government Documents Department
    Code: UNTGD

Resource Type

  • Article

Format

  • Text

Identifier

  • Report No.: UCRL-JC-134296
  • Grant Number: W-7405-Eng-48
  • Office of Scientific & Technical Information Report Number: 792014
  • Archival Resource Key: ark:/67531/metadc738349
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