At-wavelength interferometry of high-NA diffraction-limited EUV optics

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Recent advances in all-reflective diffraction-limited optical systems designed for extreme ultraviolet (EUV) lithography have pushed numerical aperture (NA) values from 0.1 to 0.3, providing Rayleigh resolutions of 27-nm. Worldwide, several high-NA EUV optics are being deployed to serve in the development of advanced lithographic techniques required for EUV lithography, including the creation and testing of new, high-resolution photoresists. One such system is installed on an undulator beamline at Lawrence Berkeley National Laboratory's Advanced Light Source. Sub{angstrom}-accuracy optical testing and alignment techniques, developed for use with the previous generations of EUV lithographic optical systems, are being extended for use at high ... continued below

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4 pages

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Goldberg, Kenneth A.; Naulleau, Patrick; Rekawa, Senajith; Denham, Paul; Liddle, J. Alexander; Anderson, Erik et al. August 1, 2003.

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Description

Recent advances in all-reflective diffraction-limited optical systems designed for extreme ultraviolet (EUV) lithography have pushed numerical aperture (NA) values from 0.1 to 0.3, providing Rayleigh resolutions of 27-nm. Worldwide, several high-NA EUV optics are being deployed to serve in the development of advanced lithographic techniques required for EUV lithography, including the creation and testing of new, high-resolution photoresists. One such system is installed on an undulator beamline at Lawrence Berkeley National Laboratory's Advanced Light Source. Sub{angstrom}-accuracy optical testing and alignment techniques, developed for use with the previous generations of EUV lithographic optical systems, are being extended for use at high NA. Considerations for interferometer design and use are discussed.

Physical Description

4 pages

Notes

INIS; OSTI as DE00816227

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  • Synchrotron Radiation & Instrumentation, San Francisco, CA (US), 08/25/2003--08/29/2003

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  • Report No.: LBNL--53704
  • Grant Number: AC03-76SF00098
  • Office of Scientific & Technical Information Report Number: 816227
  • Archival Resource Key: ark:/67531/metadc736609

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  • August 1, 2003

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  • Oct. 18, 2015, 6:40 p.m.

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  • April 4, 2016, 2:52 p.m.

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Goldberg, Kenneth A.; Naulleau, Patrick; Rekawa, Senajith; Denham, Paul; Liddle, J. Alexander; Anderson, Erik et al. At-wavelength interferometry of high-NA diffraction-limited EUV optics, article, August 1, 2003; Berkeley, California. (digital.library.unt.edu/ark:/67531/metadc736609/: accessed September 25, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.