Micro-Replication: Precision Metal parts from Electronformed Master Molds

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Description

The possibility of using through-mask electrodeposition to fill features with active sidewalls was investigated. Both metal (Ni) and conductive substrates were employed; the demolding of electroformed Ni metal parts from metal substrates was difficult despite the use of various lubricants. Because of damage to the electrodeposited parts during the demolding process, conductive plastic substrates appear more feasible than metal substrates. Direct current was capable of filling features with low aspect ratios ({approx}2) with only minor voiding. For higher aspect ratio features ({approx}7), pulsed deposition and direct current with the leveling agent coumarin appeared to be more effective than pulsed reverse ... continued below

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33 pages

Creation Information

Kelly, James J. January 1, 2002.

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This report is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. It has been viewed 69 times . More information about this report can be viewed below.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM, and Livermore, CA (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

The possibility of using through-mask electrodeposition to fill features with active sidewalls was investigated. Both metal (Ni) and conductive substrates were employed; the demolding of electroformed Ni metal parts from metal substrates was difficult despite the use of various lubricants. Because of damage to the electrodeposited parts during the demolding process, conductive plastic substrates appear more feasible than metal substrates. Direct current was capable of filling features with low aspect ratios ({approx}2) with only minor voiding. For higher aspect ratio features ({approx}7), pulsed deposition and direct current with the leveling agent coumarin appeared to be more effective than pulsed reverse deposition. Since the characteristic diffusion time constant varies with the square of the feature depth, chloride ions are necessary to prevent passivation during the long pulse off-times required for uniform feature filling through a thick mask. It is shown that although thick masks require long pulse off-times, the recommended deposition rate for uniform filling (available in the literature) should not depend on the mask thickness (although the total deposition time will).

Physical Description

33 pages

Source

  • Other Information: PBD: 1 Jan 2002

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  • Report No.: SAND2001-8732
  • Grant Number: AC04-94AL85000
  • DOI: 10.2172/793726 | External Link
  • Office of Scientific & Technical Information Report Number: 793726
  • Archival Resource Key: ark:/67531/metadc736249

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

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  • January 1, 2002

Added to The UNT Digital Library

  • Oct. 19, 2015, 7:39 p.m.

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  • April 12, 2016, 4:50 p.m.

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Kelly, James J. Micro-Replication: Precision Metal parts from Electronformed Master Molds, report, January 1, 2002; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc736249/: accessed October 16, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.