Transverse resistive wall impedance for multi-layer round chambers

PDF Version Also Available for Download.

Description

The resistive wall impedance is usually calculated assuming the skin depth being much smaller than the chamber thickness. This approximation is not always correct. In particular, it is not valid when the revolution frequency is very low (as in VLHC [1]), or the surface is coated by a thin conductive layer (as for extraction kickers [2]), or for the coherent effects in the closed orbit motion [3]. A method of analytical calculation of the transverse impedance is developed here for multi-layer vacuum chambers and applied to an arbitrary two-layer structure.

Physical Description

69 Kilobytes pages

Creation Information

Lebedev, Alexy Burov and Valeri June 11, 2002.

Context

This article is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. More information about this article can be viewed below.

Who

People and organizations associated with either the creation of this article or its content.

Sponsor

Publisher

Provided By

UNT Libraries Government Documents Department

Serving as both a federal and a state depository library, the UNT Libraries Government Documents Department maintains millions of items in a variety of formats. The department is a member of the FDLP Content Partnerships Program and an Affiliated Archive of the National Archives.

Contact Us

What

Descriptive information to help identify this article. Follow the links below to find similar items on the Digital Library.

Description

The resistive wall impedance is usually calculated assuming the skin depth being much smaller than the chamber thickness. This approximation is not always correct. In particular, it is not valid when the revolution frequency is very low (as in VLHC [1]), or the surface is coated by a thin conductive layer (as for extraction kickers [2]), or for the coherent effects in the closed orbit motion [3]. A method of analytical calculation of the transverse impedance is developed here for multi-layer vacuum chambers and applied to an arbitrary two-layer structure.

Physical Description

69 Kilobytes pages

Source

  • EPAC'02, Paris (FR), 06/02/2002--06/07/2002

Language

Item Type

Identifier

Unique identifying numbers for this article in the Digital Library or other systems.

  • Report No.: FERMILAB-Conf-02/100-T
  • Grant Number: AC02-76CH03000
  • Office of Scientific & Technical Information Report Number: 795243
  • Archival Resource Key: ark:/67531/metadc735395

Collections

This article is part of the following collection of related materials.

Office of Scientific & Technical Information Technical Reports

What responsibilities do I have when using this article?

When

Dates and time periods associated with this article.

Creation Date

  • June 11, 2002

Added to The UNT Digital Library

  • Oct. 19, 2015, 7:39 p.m.

Description Last Updated

  • April 1, 2016, 6:46 p.m.

Usage Statistics

When was this article last used?

Yesterday: 0
Past 30 days: 0
Total Uses: 2

Interact With This Article

Here are some suggestions for what to do next.

Start Reading

PDF Version Also Available for Download.

Citations, Rights, Re-Use

Lebedev, Alexy Burov and Valeri. Transverse resistive wall impedance for multi-layer round chambers, article, June 11, 2002; Batavia, Illinois. (digital.library.unt.edu/ark:/67531/metadc735395/: accessed September 20, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.