A Discharge-Flow/Chemiluminescence Study of the Reaction O + Si2H6 at Room Temperature

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Article on a discharge-flow/chemiluminescence study of the reaction O + Si2H6 at room temperature.

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13 p.

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Taylor, Craig A. & Marshall, Paul April 23, 1993.

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Article on a discharge-flow/chemiluminescence study of the reaction O + Si2H6 at room temperature.

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13 p.

Notes

Abstract: Discharge-flow kinetic studies using NO2 chemiluminescence detection of O yielded a rate constant for O+Si2H6 of (6.0±1.0) × 10−12 cm3 s−1 at 295 K, where the 95% confidence interval includes both precision and accuracy. Insertion and abstraction mechanisms are discussed, and on the assumption that H-atom abstraction dominates, a likely activation energy is about 8 kJ mol−1. This is an upper limit if insertion into the Si-Si bond is significant.

This is the accepted manuscript version of the article. Reprinted with permission from Elsevier Science Ltd., all rights reserved. The final definitive version is available here: http://www.sciencedirect.com/science/article/pii/0009261493800027

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  • Chemical Physics Letters, 1993, Amsterdam: Elsevier Science Ltd., pp. 493-496

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Publication Information

  • Publication Title: Chemical Physics Letters
  • Volume: 205
  • Issue: 6
  • Page Start: 493
  • Page End: 496
  • Peer Reviewed: Yes

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  • April 23, 1993

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  • Oct. 2, 2015, 9:40 a.m.

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Taylor, Craig A. & Marshall, Paul. A Discharge-Flow/Chemiluminescence Study of the Reaction O + Si2H6 at Room Temperature, article, April 23, 1993; [Amsterdam, Netherlands]. (digital.library.unt.edu/ark:/67531/metadc725798/: accessed December 14, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT College of Arts and Sciences.