SETEC/Semiconductor Manufacturing Technologies Program: 1999 Annual and Final Report Page: 4 of 65
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Printed December 2000
Program: 1999 Annual and Final
John McBrayer, Ph.D.
Design and Products, Dept 1730
Sandia National Laboratories
Albuquerque, NM 87185-1071
This report summarizes the results of work conducted by the Semiconductor
Manufacturing Technologies Program at Sandia National Laboratories (Sandia)
during 1999. This work was performed by one working group: the Semiconductor
Equipment Technology Center (SETEC). The group's projects included
Numerical/Experimental Characterization of the Growth of Single-Crystal
Calcium Fluoride (CaF2); The Use of High-Resolution Transmission Electron
Microscopy (HRTEM) Imaging for Certifying Critical-Dimension Reference
Materials Fabricated with Silicon Micromachining; Assembly Test Chip for Flip
Chip on Board; Plasma Mechanism Validation: Modeling and Experimentation;
and Model-Based Reduction of Contamination in Gate-Quality Nitride Reactor.
During 1999, all projects focused on meeting customer needs in a timely manner
and ensuring that projects were aligned with the goals of the National Technology
Roadmap for Semiconductors sponsored by the Semiconductor Industry
Association and with Sandia's defense mission.
This report also provides a short history of the Sandia/SEMATECH relationship
and a brief on all projects completed during the seven years of the program. And
as such, this is the final report for the Sandia/SEMATECH Cooperative Research
and Development Agreement (CRADA), SC92/01082.
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McBrayer, John D. SETEC/Semiconductor Manufacturing Technologies Program: 1999 Annual and Final Report, report, December 2000; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc716928/m1/4/: accessed May 25, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.