Chemical Reaction Mechanisms for Modeling the Fluorocarbon Plasma Etch of Silicon Oxide and Related Materials Citations, Rights, Re-Use
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Chemical Reaction Mechanisms for Modeling the Fluorocarbon Plasma Etch of Silicon Oxide and Related Materials, report, May 1, 2001; Albuquerque, New Mexico. (https://digital.library.unt.edu/ark:/67531/metadc716535/: accessed December 4, 2024), University of North Texas Libraries, UNT Digital Library, https://digital.library.unt.edu; crediting UNT Libraries Government Documents Department.
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