An AC phase measuring interferometer for measuring dn/dT of fused silica and calcium fluoride at 193 nm

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Description

A novel method for the measurement of the change in index of refraction vs. temperature (dn/dT) of fused silica and calcium fluoride at the 193 nm wavelength has been developed in support of thermal modeling efforts for the development of 193 nm-based photolithographic exposure tools. The method, based upon grating lateral shear interferometry, uses a transmissive linear grating to divide a 193 nm laser beam into several beam paths by diffraction which propagate through separate identical material samples. One diffracted order passing through one sample overlaps the undiffracted beam from a second sample and forms interference fringes dependent upon the ... continued below

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12 p.

Creation Information

Shagam, R.N. September 1, 1998.

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This report is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. It has been viewed 26 times . More information about this report can be viewed below.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

A novel method for the measurement of the change in index of refraction vs. temperature (dn/dT) of fused silica and calcium fluoride at the 193 nm wavelength has been developed in support of thermal modeling efforts for the development of 193 nm-based photolithographic exposure tools. The method, based upon grating lateral shear interferometry, uses a transmissive linear grating to divide a 193 nm laser beam into several beam paths by diffraction which propagate through separate identical material samples. One diffracted order passing through one sample overlaps the undiffracted beam from a second sample and forms interference fringes dependent upon the optical path difference between the two samples. Optical phase delay due to an index change from heating one of the samples causes the interference fringes to change sinusoidally with phase. The interferometer also makes use of AC phase measurement techniques through lateral translation of the grating. Results for several samples of fused silica and calcium fluoride are demonstrated.

Physical Description

12 p.

Notes

OSTI as DE98005923

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  • 43. international symposium on optical science, engineering, and instrumentation, San Diego, CA (United States), 19-24 Jul 1998

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  • Other: DE98005923
  • Report No.: SAND--98-0007C
  • Report No.: CONF-980731--
  • Grant Number: AC04-94AL85000
  • DOI: 10.2172/658464 | External Link
  • Office of Scientific & Technical Information Report Number: 658464
  • Archival Resource Key: ark:/67531/metadc712386

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  • September 1, 1998

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  • Sept. 12, 2015, 6:31 a.m.

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  • April 12, 2016, 9:33 p.m.

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Shagam, R.N. An AC phase measuring interferometer for measuring dn/dT of fused silica and calcium fluoride at 193 nm, report, September 1, 1998; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc712386/: accessed November 13, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.