Optical patterning of photosensitive thin film silica mesophases

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Photosensitive films incorporating molecular photoacid generators compartmentalized within a silica-surfactant mesophase were prepared by an evaporation-induced self-assembly process. UV-exposure promoted localized acid-catalyzed siloxane condensation, enabling selective etching of unexposed regions, thereby serving as a resistless technique to prepare patterned mesoporous silica. The authors also demonstrated an optically-defined mesophase transformation (hexagonal {r_arrow} tetragonal) and patterning of refractive index and wetting behavior. Spatial control of structure and function on the macro- and mesoscales is of interest for sensor arrays, nano-reactors, photonic and fluidic devices, and low dielectric constant films. More importantly, it extends the capabilities of conventional lithography from spatially defining the ... continued below

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27 p.

Creation Information

DOSHI,DHAVAL A.; HUESING,NICOLA K.; LU,MENGCHENG; FAN,HONGYOU; HURD,ALAN J. & BRINKER,C. JEFFREY February 9, 2000.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM, and Livermore, CA (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

Photosensitive films incorporating molecular photoacid generators compartmentalized within a silica-surfactant mesophase were prepared by an evaporation-induced self-assembly process. UV-exposure promoted localized acid-catalyzed siloxane condensation, enabling selective etching of unexposed regions, thereby serving as a resistless technique to prepare patterned mesoporous silica. The authors also demonstrated an optically-defined mesophase transformation (hexagonal {r_arrow} tetragonal) and patterning of refractive index and wetting behavior. Spatial control of structure and function on the macro- and mesoscales is of interest for sensor arrays, nano-reactors, photonic and fluidic devices, and low dielectric constant films. More importantly, it extends the capabilities of conventional lithography from spatially defining the presence or absence of film to spatial control of film structure and function.

Physical Description

27 p.

Notes

OSTI as DE00751244

Medium: P; Size: 27 pages

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  • Journal Name: Science; Other Information: Submitted to Science

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  • Report No.: SAND2000-0388J
  • Grant Number: AC04-94AL85000
  • Office of Scientific & Technical Information Report Number: 751244
  • Archival Resource Key: ark:/67531/metadc712309

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  • February 9, 2000

Added to The UNT Digital Library

  • Sept. 12, 2015, 6:31 a.m.

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  • April 10, 2017, 6:40 p.m.

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DOSHI,DHAVAL A.; HUESING,NICOLA K.; LU,MENGCHENG; FAN,HONGYOU; HURD,ALAN J. & BRINKER,C. JEFFREY. Optical patterning of photosensitive thin film silica mesophases, article, February 9, 2000; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc712309/: accessed September 21, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.