Polymer Effects on Acid Generation Efficiency Using EUV and DUV Exposures

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Thin resist films (< 1500 {angstrom}) based on DUV chemical approaches have been demonstrated for use in EUV lithography. Resists with good sensitivity (5--6 mJ/cm{sup 2}) were observed but imaging mechanisms, in particular as they affect sensitivity, are poorly understood. To clarify mechanisms leading to photosensitivity, acid-generation efficiency at both EUV and DUV wavelengths was measured for the most promising EUV resist compositions as well as initial radiation damage experiments. In previous work, polymer composition was found to be more important in determining the relative dose to print of resists to EUV and DUV radiation than was PAG composition. Here, ... continued below

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17 p.

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Dentinger, P. May 30, 2000.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM, and Livermore, CA (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

Thin resist films (< 1500 {angstrom}) based on DUV chemical approaches have been demonstrated for use in EUV lithography. Resists with good sensitivity (5--6 mJ/cm{sup 2}) were observed but imaging mechanisms, in particular as they affect sensitivity, are poorly understood. To clarify mechanisms leading to photosensitivity, acid-generation efficiency at both EUV and DUV wavelengths was measured for the most promising EUV resist compositions as well as initial radiation damage experiments. In previous work, polymer composition was found to be more important in determining the relative dose to print of resists to EUV and DUV radiation than was PAG composition. Here, acid generating efficiency for several polymers upon exposure to EUV and DW are compared to gain insight into the role of the polymer and PAG in converting the incident EUV photon energy into resist images. It is shown that acid generation efficiencies at EUV do not track efficiencies measured on identical films with DUV exposures, and is attributable to polymer and polymer/PAG interactions. No particular structural feature of the polymer could be correlated to the acid generation results. Radiation damage studies showed that polymers that create acid in different yields at EUV do not show differences in radiation damage, as detected by dissolution rate changes. In addition, it is shown that no significant dissolution altering mechanisms occur with EW radiation at relevant exposure doses. The authors conclude that photospeed differences between EUV and DUV are quantitatively attributable to acid generation efficiencies for the compositions studied.

Physical Description

17 p.

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OSTI as DE00758913

Medium: P; Size: 17 pages

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  • EIPBN 2000/J. Vac. Sci. and Technology B, Palm Springs, CA (US), 05/30/2000--06/02/2000

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  • Report No.: SAND2000-8763C
  • Grant Number: AC04-94AL85000
  • Office of Scientific & Technical Information Report Number: 758913
  • Archival Resource Key: ark:/67531/metadc710992

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Creation Date

  • May 30, 2000

Added to The UNT Digital Library

  • Sept. 12, 2015, 6:31 a.m.

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  • April 7, 2017, 3:45 p.m.

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Dentinger, P. Polymer Effects on Acid Generation Efficiency Using EUV and DUV Exposures, article, May 30, 2000; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc710992/: accessed September 19, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.