In situ surface roughness measurement during PECVD diamond film growth

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Description

To investigate the development of surface morphology and bulk optical attenuation in diamond films, we have followed diamond film growth on silicon by in-situ laser reflection interferometry in a microwave plasma chemical vapor deposition system. A model for the interpretation of the reflectivity data in terms of film thickness, rms surface roughness and bulk losses due to scattering and absorption is presented. Results are compared with ex situ measurements of these quantities and found to be in good agreement.

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7 p.

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Zuiker, C.D.; Gruen, D.M. & Krauss, A.R. June 1, 1995.

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Description

To investigate the development of surface morphology and bulk optical attenuation in diamond films, we have followed diamond film growth on silicon by in-situ laser reflection interferometry in a microwave plasma chemical vapor deposition system. A model for the interpretation of the reflectivity data in terms of film thickness, rms surface roughness and bulk losses due to scattering and absorption is presented. Results are compared with ex situ measurements of these quantities and found to be in good agreement.

Physical Description

7 p.

Notes

OSTI as DE95013411

Source

  • 4. international symposium on diamond materials, Reno, NV (United States), 21-26 May 1995

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  • Other: DE95013411
  • Report No.: ANL/CHM/CP--85037
  • Report No.: CONF-9505192--2
  • Grant Number: W-31-109-ENG-38
  • Office of Scientific & Technical Information Report Number: 69354
  • Archival Resource Key: ark:/67531/metadc710666

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  • June 1, 1995

Added to The UNT Digital Library

  • Sept. 12, 2015, 6:31 a.m.

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  • Dec. 16, 2015, 5:07 p.m.

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Zuiker, C.D.; Gruen, D.M. & Krauss, A.R. In situ surface roughness measurement during PECVD diamond film growth, article, June 1, 1995; Illinois. (digital.library.unt.edu/ark:/67531/metadc710666/: accessed August 24, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.