Role of alumina phase and size in tungsten CMP

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The role of the alumina particle phase and size on polish rate and process temperature was studied to elucidate removal mechanisms involved in tungsten CMP using potassium iodate-based slurries. Additional work including polishing of blanket PETEOS and titanium films, and polishing of M1 to V1 to M2 electrical test structures was performed to determine the performance of the various aluminas in production CMP. The polish rate of tungsten was highest with alpha alumina. Delta/theta and gamma alumina showed lower polish rates. Tungsten and PETEOS polish rates increased with particle size. Only alpha alumina was able to clear the titanium barrier ... continued below

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8 p.

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STEIN,DAVID J. & HER,ROBERT Y.-S. February 1, 2000.

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This article is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. It has been viewed 96 times , with 4 in the last month . More information about this article can be viewed below.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM, and Livermore, CA (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

The role of the alumina particle phase and size on polish rate and process temperature was studied to elucidate removal mechanisms involved in tungsten CMP using potassium iodate-based slurries. Additional work including polishing of blanket PETEOS and titanium films, and polishing of M1 to V1 to M2 electrical test structures was performed to determine the performance of the various aluminas in production CMP. The polish rate of tungsten was highest with alpha alumina. Delta/theta and gamma alumina showed lower polish rates. Tungsten and PETEOS polish rates increased with particle size. Only alpha alumina was able to clear the titanium barrier stack. The size of the alpha alumina did not effect the electrical characteristics of short loop electrical test structures.

Physical Description

8 p.

Notes

OSTI as DE00751171

Medium: P; Size: 8 pages

Source

  • CMP-MIC 2000, Santa Clara, CA (US), 03/01/2000--03/03/2000

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  • Report No.: SAND2000-0311C
  • Grant Number: AC04-94AL85000
  • Office of Scientific & Technical Information Report Number: 751171
  • Archival Resource Key: ark:/67531/metadc710313

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Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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  • February 1, 2000

Added to The UNT Digital Library

  • Sept. 12, 2015, 6:31 a.m.

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  • April 11, 2017, 7:04 p.m.

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STEIN,DAVID J. & HER,ROBERT Y.-S. Role of alumina phase and size in tungsten CMP, article, February 1, 2000; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc710313/: accessed September 24, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.