Composition and structure of sputter deposited erbium hydride thin films

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Erbium hydride thin films are grown onto polished, a-axis {alpha} Al{sub 2}O{sub 3} (sapphire) substrates by reactive ion beam sputtering and analyzed to determine composition, phase and microstructure. Erbium is sputtered while maintaining a H{sub 2} partial pressure of 1.4 x 10{sup {minus}4} Torr. Growth is conducted at several substrate temperatures between 30 and 500 C. Rutherford backscattering spectrometry (RBS) and elastic recoil detection analyses after deposition show that the H/Er areal density ratio is approximately 3:1 for growth temperatures of 30, 150 and 275 C, while for growth above {approximately}430 C, the ratio of hydrogen to metal is closer ... continued below

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6 p.

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ADAMS,DAVID P.; ROMERO,JUAN A.; RODRIGUEZ,MARK A.; FLORO,JERROLD A. & BANKS,JAMES C. May 10, 2000.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM, and Livermore, CA (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

Erbium hydride thin films are grown onto polished, a-axis {alpha} Al{sub 2}O{sub 3} (sapphire) substrates by reactive ion beam sputtering and analyzed to determine composition, phase and microstructure. Erbium is sputtered while maintaining a H{sub 2} partial pressure of 1.4 x 10{sup {minus}4} Torr. Growth is conducted at several substrate temperatures between 30 and 500 C. Rutherford backscattering spectrometry (RBS) and elastic recoil detection analyses after deposition show that the H/Er areal density ratio is approximately 3:1 for growth temperatures of 30, 150 and 275 C, while for growth above {approximately}430 C, the ratio of hydrogen to metal is closer to 2:1. However, x-ray diffraction shows that all films have a cubic metal sublattice structure corresponding to that of ErH{sub 2}. RBS and Auger electron that sputtered erbium hydride thin films are relatively free of impurities.

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6 p.

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OSTI as DE00756104

Medium: P; Size: 6 pages

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  • Materials Research Society, San Francisco, CA (US), 04/24/2000--04/28/2000

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  • Report No.: SAND2000-1177C
  • Grant Number: AC04-94AL85000
  • Office of Scientific & Technical Information Report Number: 756104
  • Archival Resource Key: ark:/67531/metadc709612

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  • May 10, 2000

Added to The UNT Digital Library

  • Sept. 12, 2015, 6:31 a.m.

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  • April 11, 2017, 12:57 p.m.

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ADAMS,DAVID P.; ROMERO,JUAN A.; RODRIGUEZ,MARK A.; FLORO,JERROLD A. & BANKS,JAMES C. Composition and structure of sputter deposited erbium hydride thin films, article, May 10, 2000; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc709612/: accessed September 22, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.