Synthesis of silicon nitride powders in pulsed RF plasmas

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Description

Nanometer size silicon nitride particles are synthesized using a pulsed radio frequency plasma technique. The plasma is modulated with a square-wave on/off cycle of varying period to control size and morphology and to deduce the growth kinetics. In situ laser light scattering and ex situ particle analysis are used to study the nucleation and growth. For SiH{sub 4}/Ar plasmas which nucleate silicon particles, an initial extremely rapid growth phase is followed by a slower growth rate, approaching the rate of thin film deposition on adjacent flat surfaces. In SiH{sub 4}/NH{sub 3} plasmas, silicon nitride particle size can be tightly controlled ... continued below

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9 p.

Creation Information

Buss, R.J.; Ho, P. & Babu, S.V. May 1, 1995.

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Authors

  • Buss, R.J.
  • Ho, P. Sandia National Labs., Albuquerque, NM (United States)
  • Babu, S.V. Clarkson Univ., Potsdam, NY (United States). Dept. of Chemical Engineering

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

Nanometer size silicon nitride particles are synthesized using a pulsed radio frequency plasma technique. The plasma is modulated with a square-wave on/off cycle of varying period to control size and morphology and to deduce the growth kinetics. In situ laser light scattering and ex situ particle analysis are used to study the nucleation and growth. For SiH{sub 4}/Ar plasmas which nucleate silicon particles, an initial extremely rapid growth phase is followed by a slower growth rate, approaching the rate of thin film deposition on adjacent flat surfaces. In SiH{sub 4}/NH{sub 3} plasmas, silicon nitride particle size can be tightly controlled by adjusting the plasma-on time. The size dispersion of the particles is large and is consistent with a process of continual nucleation during the plasma-on period. The observed polydispersity differs dramatically from that reported from other laboratories.

Physical Description

9 p.

Notes

OSTI as DE95011607

Source

  • 9. annual conference on fossil energy materials, Oak Ridge, TN (United States), 16-18 May 1995

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Identifier

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  • Other: DE95011607
  • Report No.: SAND--95-0934C
  • Report No.: CONF-9505204--1
  • Grant Number: AC04-94AL85000
  • DOI: 10.2172/72971 | External Link
  • Office of Scientific & Technical Information Report Number: 72971
  • Archival Resource Key: ark:/67531/metadc709576

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Creation Date

  • May 1, 1995

Added to The UNT Digital Library

  • Sept. 12, 2015, 6:31 a.m.

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  • April 14, 2016, 1:25 p.m.

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Buss, R.J.; Ho, P. & Babu, S.V. Synthesis of silicon nitride powders in pulsed RF plasmas, report, May 1, 1995; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc709576/: accessed August 18, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.