Control of the RF waveform at the chuck of an industrial oxide-etch reactor

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Description

Radio frequency (rf) power is applied to the chuck of a high-density plasma reactor in order to extract ions and to control the energy of the ions used for the fabrication of microelectronic devices. In many cases, the temporal shape of the rf waveform largely determines the shape of the spectrum of those extracted ions, thereby strongly affecting feature evolution. Using auxiliary rf circuits the authors successfully made major changes to the rf potential waveform at the chuck of an Applied Materials 5300 HDP Omega reactor without affecting the normal functioning of the reactor's control systems. This work established the ... continued below

Physical Description

38 p.

Creation Information

BERRY,LEE; MAYNARD,HELEN; MILLER,PAUL A.; MOORE,TONY; PENDLEY,MICHAEL; RESTA,VICTORIA et al. May 4, 2000.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM, and Livermore, CA (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

Radio frequency (rf) power is applied to the chuck of a high-density plasma reactor in order to extract ions and to control the energy of the ions used for the fabrication of microelectronic devices. In many cases, the temporal shape of the rf waveform largely determines the shape of the spectrum of those extracted ions, thereby strongly affecting feature evolution. Using auxiliary rf circuits the authors successfully made major changes to the rf potential waveform at the chuck of an Applied Materials 5300 HDP Omega reactor without affecting the normal functioning of the reactor's control systems. This work established the practical feasibility of techniques for modifying the ion energy distribution functions of industrial reactors.

Physical Description

38 p.

Notes

OSTI as DE00755601

Medium: P; Size: 38 pages

Source

  • Journal Name: Jouranl of Vacuum Science and Technology; Other Information: Submitted to Journal of Vacuum Science and Technology

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  • Report No.: SAND2000-1132J
  • Grant Number: AC04-94AL85000
  • Office of Scientific & Technical Information Report Number: 755601
  • Archival Resource Key: ark:/67531/metadc708290

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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Creation Date

  • May 4, 2000

Added to The UNT Digital Library

  • Sept. 12, 2015, 6:31 a.m.

Description Last Updated

  • April 12, 2017, 2:34 p.m.

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BERRY,LEE; MAYNARD,HELEN; MILLER,PAUL A.; MOORE,TONY; PENDLEY,MICHAEL; RESTA,VICTORIA et al. Control of the RF waveform at the chuck of an industrial oxide-etch reactor, article, May 4, 2000; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc708290/: accessed June 19, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.