Mechanistic study of dielectric chemical mechanical polishing by spectral and scaling analysis of atomic force microscope images

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Description

Thermal oxide and PETEOS oxide surfaces, polished on an IPEC 472 with different combinations of polish pad, slurry, and polishing conditions, were studied with ex situ atomic force microscopy. The post polish surfaces were analyzed qualitatively by visual inspection and quantitatively by spectral and scaling analyses. Spectral and scaling analyses gave consistent interpretations of morphology evolution. Polishing with either a fixed abrasive pad or alumina-based slurry occurred via a mechanism for which asperities are removed and recesses are filled. A sputtering-type mechanism may contribute to material removal when polishing with silica- or ceria-based slurries.

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24 p.

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Verhoff, M.L. December 22, 1999.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM, and Livermore, CA (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

Thermal oxide and PETEOS oxide surfaces, polished on an IPEC 472 with different combinations of polish pad, slurry, and polishing conditions, were studied with ex situ atomic force microscopy. The post polish surfaces were analyzed qualitatively by visual inspection and quantitatively by spectral and scaling analyses. Spectral and scaling analyses gave consistent interpretations of morphology evolution. Polishing with either a fixed abrasive pad or alumina-based slurry occurred via a mechanism for which asperities are removed and recesses are filled. A sputtering-type mechanism may contribute to material removal when polishing with silica- or ceria-based slurries.

Physical Description

24 p.

Notes

OSTI as DE00750215

Medium: P; Size: 24 pages

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  • 196th Meeting of the Electrochemical Society, Honolulu, HI (US), 10/17/1999--10/22/1999

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  • Report No.: SAND99-3216C
  • Grant Number: AC04-94AL85000
  • Office of Scientific & Technical Information Report Number: 750215
  • Archival Resource Key: ark:/67531/metadc706707

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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  • December 22, 1999

Added to The UNT Digital Library

  • Sept. 12, 2015, 6:31 a.m.

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  • April 10, 2017, 4:43 p.m.

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Verhoff, M.L. Mechanistic study of dielectric chemical mechanical polishing by spectral and scaling analysis of atomic force microscope images, article, December 22, 1999; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc706707/: accessed November 19, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.