The influence of feature sidewall tolerance on minimum absorber thickness for LIGA x-ray masks

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Description

Minimizing mask absorber thickness is an important practical concern in producing very small features by the LIGA process. To assist in this minimization, the authors have developed coupled numerical models describing both the exposure and development of a thick PMMA resist. The exposure model addresses multi-wavelength, one-dimensional x-ray transmission through multiple beam filters, through the mask substrate and absorber, and the subsequent attenuation and photon absorption in the PMMA resist. The development model describes one-dimensional dissolution of a feature and its sidewalls, taking into account the variation in absorbed dose through the PMMA thickness. These exposure and development models are ... continued below

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18 p.

Creation Information

Griffiths, S. K.; Hruby, J. M. & Ting, A. February 1, 1999.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM, and Livermore, CA (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

Minimizing mask absorber thickness is an important practical concern in producing very small features by the LIGA process. To assist in this minimization, the authors have developed coupled numerical models describing both the exposure and development of a thick PMMA resist. The exposure model addresses multi-wavelength, one-dimensional x-ray transmission through multiple beam filters, through the mask substrate and absorber, and the subsequent attenuation and photon absorption in the PMMA resist. The development model describes one-dimensional dissolution of a feature and its sidewalls, taking into account the variation in absorbed dose through the PMMA thickness. These exposure and development models are coupled in a single interactive code, permitting the automated adjustment of mask absorber thickness to yield a prescribed sidewall taper or dissolution distance. They have used this tool to compute the minimum required absorber thickness yielding a prescribed sidewall tolerance for exposures performed at the ALS, SSRL and NSLS synchrotron sources. Results are presented as a function of the absorbed dose for a range of the prescribed sidewall tolerance, feature size, PMMA thickness, mask substrate thickness and the development temperature.

Physical Description

18 p.

Notes

OSTI as DE00751005

Medium: P; Size: 18 pages

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  • Other Information: PBD: 1 Feb 1999

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  • Report No.: SAND99-8217
  • Grant Number: AC04-94AL85000
  • DOI: 10.2172/751005 | External Link
  • Office of Scientific & Technical Information Report Number: 751005
  • Archival Resource Key: ark:/67531/metadc706120

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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Creation Date

  • February 1, 1999

Added to The UNT Digital Library

  • Sept. 12, 2015, 6:31 a.m.

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  • April 7, 2017, 4:08 p.m.

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Griffiths, S. K.; Hruby, J. M. & Ting, A. The influence of feature sidewall tolerance on minimum absorber thickness for LIGA x-ray masks, report, February 1, 1999; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc706120/: accessed June 17, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.