X-ray diffraction (XRD) was performed in situ during annealing of a Co/Ti/Si(001) multilayer, which produced an epitaxial CoSi{sub 2} layer. The results indicate that the Ti layer did. not stay intact during the reaction, and thus could not act like a membrane, moderating Co/Si interdiffusion. A strongly textured metastable phase (M) formed prior to CoSi{sub 2} nucleation. This intermediary reaction product was unobservable upon completion of the anneal. We report that nucleation and growth of CoSi{sub 2} on Si(100) took place in the presence of M, a new Co-Ti-Si-(O) phase, located at the metal/Si interface. M might play an important ...
continued below
Publisher Info:
Argonne National Lab., IL (United States)
Place of Publication:
Illinois
Provided By
UNT Libraries Government Documents Department
Serving as both a federal and a state depository library, the UNT Libraries Government Documents Department maintains millions of items in a variety of formats. The department is a member of the FDLP Content Partnerships Program and an Affiliated Archive of the National Archives.
Descriptive information to help identify this report.
Follow the links below to find similar items on the Digital Library.
Description
X-ray diffraction (XRD) was performed in situ during annealing of a Co/Ti/Si(001) multilayer, which produced an epitaxial CoSi{sub 2} layer. The results indicate that the Ti layer did. not stay intact during the reaction, and thus could not act like a membrane, moderating Co/Si interdiffusion. A strongly textured metastable phase (M) formed prior to CoSi{sub 2} nucleation. This intermediary reaction product was unobservable upon completion of the anneal. We report that nucleation and growth of CoSi{sub 2} on Si(100) took place in the presence of M, a new Co-Ti-Si-(O) phase, located at the metal/Si interface. M might play an important role in the perfection of the silicide. Ti and Co metals intermix already below 300{degrees}C, and there was evidence that metallic Ti precipitated at the surface, commencing at 550{degrees}C.
This report is part of the following collection of related materials.
Office of Scientific & Technical Information Technical Reports
Reports, articles and other documents harvested from the Office of Scientific and Technical Information.
Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.
Selinder, T.I.; Roberts, T.A.; Miller, D.J.; Beno, M.A.; Knapp, G.S.; Gray, K.E. et al.In situ x-ray diffraction study of CoSi{sub 2} formation during annealing of a Co/Ti bilayer on Si*(100),
report,
June 1, 1995;
Illinois.
(digital.library.unt.edu/ark:/67531/metadc704784/:
accessed April 24, 2018),
University of North Texas Libraries, Digital Library, digital.library.unt.edu;
crediting UNT Libraries Government Documents Department.