In situ x-ray diffraction study of CoSi{sub 2} formation during annealing of a Co/Ti bilayer on Si*(100)

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X-ray diffraction (XRD) was performed in situ during annealing of a Co/Ti/Si(001) multilayer, which produced an epitaxial CoSi{sub 2} layer. The results indicate that the Ti layer did. not stay intact during the reaction, and thus could not act like a membrane, moderating Co/Si interdiffusion. A strongly textured metastable phase (M) formed prior to CoSi{sub 2} nucleation. This intermediary reaction product was unobservable upon completion of the anneal. We report that nucleation and growth of CoSi{sub 2} on Si(100) took place in the presence of M, a new Co-Ti-Si-(O) phase, located at the metal/Si interface. M might play an important ... continued below

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15 p.

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Selinder, T.I.; Roberts, T.A.; Miller, D.J.; Beno, M.A.; Knapp, G.S.; Gray, K.E. et al. June 1, 1995.

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X-ray diffraction (XRD) was performed in situ during annealing of a Co/Ti/Si(001) multilayer, which produced an epitaxial CoSi{sub 2} layer. The results indicate that the Ti layer did. not stay intact during the reaction, and thus could not act like a membrane, moderating Co/Si interdiffusion. A strongly textured metastable phase (M) formed prior to CoSi{sub 2} nucleation. This intermediary reaction product was unobservable upon completion of the anneal. We report that nucleation and growth of CoSi{sub 2} on Si(100) took place in the presence of M, a new Co-Ti-Si-(O) phase, located at the metal/Si interface. M might play an important role in the perfection of the silicide. Ti and Co metals intermix already below 300{degrees}C, and there was evidence that metallic Ti precipitated at the surface, commencing at 550{degrees}C.

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15 p.

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OSTI as DE95012213

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  • Other Information: PBD: [1995]

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  • Other: DE95012213
  • Report No.: ANL/MSD/PP--84782
  • Grant Number: W-31109-ENG-38
  • DOI: 10.2172/70779 | External Link
  • Office of Scientific & Technical Information Report Number: 70779
  • Archival Resource Key: ark:/67531/metadc704784

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  • June 1, 1995

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  • Sept. 12, 2015, 6:31 a.m.

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  • Aug. 23, 2016, 3:34 p.m.

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Selinder, T.I.; Roberts, T.A.; Miller, D.J.; Beno, M.A.; Knapp, G.S.; Gray, K.E. et al. In situ x-ray diffraction study of CoSi{sub 2} formation during annealing of a Co/Ti bilayer on Si*(100), report, June 1, 1995; Illinois. (digital.library.unt.edu/ark:/67531/metadc704784/: accessed April 24, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.