Statistics: Wafer and reticle positioning system for the Extreme Ultraviolet Lithography Engineering Test Stand

Context

This article is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. It has been viewed 250 times , with 12 in the last month . More information about this article can be viewed below.

Usage

  • 250 Total Uses
  • 12 Uses Last 32 Days

Usage by Month/Year

Year January February March April May June July August September October November December Total
2018 9 16 12 18 23 7 8 28 15 13 9 8 166
2017 1 2 0 0 1 2 2 3 15 15 13 20 74
2016 0 1 1 0 2 1 0 0 1 2 0 2 10

Recent Referral Breakdown for the last 32 days (11/12/2018 to 12/14/2018)

Referral Type Total Percentage
Search Engine 12 100%
Referral Total Percentage
www.google.com 5 41%
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www.google.co.kr 3 25%
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https://www.google.co.kr/blank.html
www.google.no 1 8%
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www.google.com.tw 1 8%
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www.bing.com 1 8%
http://www.bing.com/search?q=euvl+llc+maglev+wafer+reticle+stage
www.google.co.in 1 8%
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