Statistics: Wafer and reticle positioning system for the Extreme Ultraviolet Lithography Engineering Test Stand

Context

This article is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. It has been viewed 215 times , with 16 in the last month . More information about this article can be viewed below.

Usage

  • 215 Total Uses
  • 16 Uses Last 30 Days

Usage by Month/Year

Year January February March April May June July August September October November December Total
2018 9 16 12 18 23 7 8 28 10 131
2017 1 2 0 0 1 2 2 3 15 15 13 20 74
2016 0 1 1 0 2 1 0 0 1 2 0 2 10

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Search Engine 17 100%
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