Wafer and reticle positioning system for the Extreme Ultraviolet Lithography Engineering Test Stand

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This paper is an overview of the wafer and reticle positioning system of the Extreme Ultraviolet Lithography (EUVL) Engineering Test Stand (ETS). EUVL represents one of the most promising technologies for supporting the integrated circuit (IC) industry's lithography needs for critical features below 100nm. EUVL research and development includes development of capabilities for demonstrating key EUV technologies. The ETS is under development at the EUV Virtual National Laboratory, to demonstrate EUV full-field imaging and provide data that supports production-tool development. The stages and their associated metrology operated in a vacuum environment and must meet stringent outgassing specifications. A tight tolerance ... continued below

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11 p.

Creation Information

WRONOSKY,JOHN B.; SMITH,TONY G.; CRAIG,MARCUS J.; STURGIS,BEVERLY R.; DARNOLD,JOEL R.; WERLING,DAVID K. et al. January 27, 2000.

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This article is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. It has been viewed 76 times , with 19 in the last month . More information about this article can be viewed below.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM, and Livermore, CA (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

This paper is an overview of the wafer and reticle positioning system of the Extreme Ultraviolet Lithography (EUVL) Engineering Test Stand (ETS). EUVL represents one of the most promising technologies for supporting the integrated circuit (IC) industry's lithography needs for critical features below 100nm. EUVL research and development includes development of capabilities for demonstrating key EUV technologies. The ETS is under development at the EUV Virtual National Laboratory, to demonstrate EUV full-field imaging and provide data that supports production-tool development. The stages and their associated metrology operated in a vacuum environment and must meet stringent outgassing specifications. A tight tolerance is placed on the stage tracking performance to minimize image distortion and provide high position repeatability. The wafer must track the reticle with less than {+-}3nm of position error and jitter must not exceed 10nm rms. To meet these performance requirements, magnetically levitated positioning stages utilizing a system of sophisticated control electronics will be used. System modeling and experimentation have contributed to the development of the positioning system and results indicate that desired ETS performance is achievable.

Physical Description

11 p.

Notes

OSTI as DE00751082

Medium: P; Size: 11 pages

Source

  • SPIE's International Symposium on Microlithograph 2000 - International Society for Optical Engineering, Santa Clara, CA (US), 02/27/2000--03/03/2000

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  • Report No.: SAND2000-0227C
  • Grant Number: AC04-94AL85000
  • Office of Scientific & Technical Information Report Number: 751082
  • Archival Resource Key: ark:/67531/metadc702960

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

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Creation Date

  • January 27, 2000

Added to The UNT Digital Library

  • Sept. 12, 2015, 6:31 a.m.

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  • April 6, 2017, 7:47 p.m.

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WRONOSKY,JOHN B.; SMITH,TONY G.; CRAIG,MARCUS J.; STURGIS,BEVERLY R.; DARNOLD,JOEL R.; WERLING,DAVID K. et al. Wafer and reticle positioning system for the Extreme Ultraviolet Lithography Engineering Test Stand, article, January 27, 2000; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc702960/: accessed December 18, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.