Electrically Insulating Films Deposited on V-4Cr-4Ti by Reactive CVD Page: 1 of 9
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0 ale rjzally Insulating Films Depos
on V-4%Cr-4%Ti by Reactive CVAu -9vor c --
J.-H. Park
Energy Technology Division
Argonne National Laboratory
Argonne, IL 60439
April 1998
The submitted manuscript has been created
by the University of Chicago as Operator of
Argonne National Laboratory ("Argonne')
under Contract No. W-31-109-ENG-38 with
the U.S. Department of Energy. The U.S.
Government retains for itself, and others act-
ing on its behalf, a paid-up, nonexclusive,
irrevocable worldwide license in said article
to reproduce, prepare derivative works, dis-
tribute copies to the public, and perform pub-
licly and display publicly, by or on behalf of
the Government.Manuscript for 12th Surface Modification Technologies Conference held in conjunction with
Symposium of Materials Solutions at ASM International Conference, Chicago, 12-15 October
1998.
*Work supported by the U.S. Department of Energy, Office of Fusion Energy Research, under
Contract W-31-109-Eng-38.
MASTER ,
WtR9UT!" OF ThiS DOCUM~ a tl WTED4
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Park, J. H. Electrically Insulating Films Deposited on V-4Cr-4Ti by Reactive CVD, article, April 1, 1998; Argonne, Illinois. (https://digital.library.unt.edu/ark:/67531/metadc702564/m1/1/: accessed April 19, 2024), University of North Texas Libraries, UNT Digital Library, https://digital.library.unt.edu; crediting UNT Libraries Government Documents Department.