Tungsten-vanadium oxide sputtered films for Electrochromic Devices

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Mixed vanadium and tungsten oxide films with compositions ranging from 0 to 100% vanadium (metals basis) were prepared by reactive sputtering from metallic vanadium and tungsten targets in an atmosphere of argon and oxygen. The vanadium content varied smoothly with the fraction of total power applied to the vanadium target. Films containing vanadium were more color neutral than pure tungsten oxide films, tending to gray-brown at high V fraction. The electrochromic switching performance of these films was investigated by in situ monitoring of their visible transmittance during lithium insertion/extraction cycling in a non-aqueous electrolyte (1M LiClO{sub 4} in propylene carbonate). ... continued below

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9 p.

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Michalak, F.; Richardson, T.; Rubin, M.; Slack, J. & von Rottkay, K. October 1, 1998.

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Mixed vanadium and tungsten oxide films with compositions ranging from 0 to 100% vanadium (metals basis) were prepared by reactive sputtering from metallic vanadium and tungsten targets in an atmosphere of argon and oxygen. The vanadium content varied smoothly with the fraction of total power applied to the vanadium target. Films containing vanadium were more color neutral than pure tungsten oxide films, tending to gray-brown at high V fraction. The electrochromic switching performance of these films was investigated by in situ monitoring of their visible transmittance during lithium insertion/extraction cycling in a non-aqueous electrolyte (1M LiClO{sub 4} in propylene carbonate). The solar transmittance and reflectance was measured ex situ. Films with vanadium content greater than about 15% exhibited a marked decrease in switching range. Coloration efficiencies followed a similar trend.

Physical Description

9 p.

Notes

OSTI as DE00007354

Medium: P; Size: 9 pages

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  • Electrochemical Society Conference, Boston, MA (US), 11/01/1998--11/06/1998

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  • Report No.: LBNL--42381
  • Report No.: OM-393
  • Grant Number: AC03-76SF00098
  • Office of Scientific & Technical Information Report Number: 7354
  • Archival Resource Key: ark:/67531/metadc702178

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  • October 1, 1998

Added to The UNT Digital Library

  • Sept. 12, 2015, 6:31 a.m.

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  • April 11, 2017, 8:10 p.m.

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Michalak, F.; Richardson, T.; Rubin, M.; Slack, J. & von Rottkay, K. Tungsten-vanadium oxide sputtered films for Electrochromic Devices, article, October 1, 1998; Berkeley, California. (digital.library.unt.edu/ark:/67531/metadc702178/: accessed June 24, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.