Future prospects for ECR plasma generators with improved charge state distributions

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The growing number and variety of fundamental, applied, and industrial uses for high intensity, high charge state ion beams continues to be the driving force behind efforts to develop Electron Cyclotron Resonance (ECR) ion sources with superior performance characteristics. Incumbent with the advent of sub-micron electronic devices and their fabrication has been the demand for improved process control and optimization. These demands have led to the development of methods for cleaning, chemical etching, and deposition of thin films based on the use of plasma devices including ECR sources. Despite the steady advance in the technology, ECR plasma heating has not ... continued below

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16 p.

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Alton, G.D. & Liu, Y. June 1, 1997.

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Description

The growing number and variety of fundamental, applied, and industrial uses for high intensity, high charge state ion beams continues to be the driving force behind efforts to develop Electron Cyclotron Resonance (ECR) ion sources with superior performance characteristics. Incumbent with the advent of sub-micron electronic devices and their fabrication has been the demand for improved process control and optimization. These demands have led to the development of methods for cleaning, chemical etching, and deposition of thin films based on the use of plasma devices including ECR sources. Despite the steady advance in the technology, ECR plasma heating has not yet reached its full potential in terms of charge state and intensity within a particular charge state, in part, because of the narrow band width, single-frequency microwave radiation commonly used to heat the plasma electrons. This heating technique, coupled with conventional minimum-B configuration magnetic fields used for confining the electrons, resulting in the formation of the thin, ECR surfaces within the plasma volumes of these sources. This report identifies fundamentally important methods for enhancing the performances of ECR plasma generators by transforming the ECR zones from surfaces to volumes. Two methods are readily available for increasing the sizes of these zones. These techniques include: (1) a tailored magnetic field configuration in combination with single-frequency microwave radiation to create a large uniformly distributed ECR volume and; (2) the use of broadband-frequency domain techniques derived from standard TWT technology, to transform the resonant plasma surfaces of traditional ECR ion sources into resonant plasma volumes.

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16 p.

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INIS; OSTI as DE97008561

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  • 1997 AIAA plasmadynamics and lasers conference, Atlanta, GA (United States), 23-25 Jun 1997

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  • Other: DE97008561
  • Report No.: CONF-9706174--1
  • Grant Number: AC05-96OR22464;FG05-87ER40361
  • Office of Scientific & Technical Information Report Number: 642724
  • Archival Resource Key: ark:/67531/metadc698899

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

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  • June 1, 1997

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  • Aug. 14, 2015, 8:43 a.m.

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  • Jan. 25, 2016, 12:49 p.m.

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Alton, G.D. & Liu, Y. Future prospects for ECR plasma generators with improved charge state distributions, article, June 1, 1997; Tennessee. (digital.library.unt.edu/ark:/67531/metadc698899/: accessed October 18, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.