The use of reactive ion sputtering to produce clean germanium surfaces in a carbon rich environment -- An ion scattering study

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The authors have used the ion spectroscopic techniques of direct recoil spectroscopy (DRS) and mass spectroscopy of recoiled ions (MSRI) to demonstrate that low energy reactive ion sputtering of Ge is capable of removing surface impurities such as carbon. The experiments were performed in a vacuum chamber maintained at 3.5 {times} 10{sup {minus}7} Torr. At these pressures, physical sputtering using noble gas is not effective for cleaning Ge surfaces as carbon re-deposits onto the surface. In this paper, the authors demonstrate that reactive sputtering of Ge using 4.0 keV nitrogen at a Ge surface temperature of {approximately} 740 K and ... continued below

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21 p.

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Smentkowski, V.S.; Krauss, A.R.; Gruen, D.M.; Holecek, J.C. & Schultz, J.A. October 7, 1997.

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Description

The authors have used the ion spectroscopic techniques of direct recoil spectroscopy (DRS) and mass spectroscopy of recoiled ions (MSRI) to demonstrate that low energy reactive ion sputtering of Ge is capable of removing surface impurities such as carbon. The experiments were performed in a vacuum chamber maintained at 3.5 {times} 10{sup {minus}7} Torr. At these pressures, physical sputtering using noble gas is not effective for cleaning Ge surfaces as carbon re-deposits onto the surface. In this paper, the authors demonstrate that reactive sputtering of Ge using 4.0 keV nitrogen at a Ge surface temperature of {approximately} 740 K and above removes surface carbon and deposits nitrogen on the Ge surface. Heating the nitrogen exposed Ge surface to above {approximately} 880 K results in the desorption of nitrogen and generates an atomically clean Ge surface, under poor vacuum conditions.

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21 p.

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OSTI as DE98050540

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  • 44. national symposium of the American Vacuum Society, San Jose, CA (United States), 20-24 Oct 1997

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  • Other: DE98050540
  • Report No.: ANL/CHM/CP--93624
  • Report No.: CONF-971029--
  • Grant Number: W-31109-ENG-38
  • DOI: 10.2172/554846 | External Link
  • Office of Scientific & Technical Information Report Number: 554846
  • Archival Resource Key: ark:/67531/metadc698178

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  • October 7, 1997

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  • Aug. 14, 2015, 8:43 a.m.

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  • Dec. 15, 2015, 12:10 p.m.

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Smentkowski, V.S.; Krauss, A.R.; Gruen, D.M.; Holecek, J.C. & Schultz, J.A. The use of reactive ion sputtering to produce clean germanium surfaces in a carbon rich environment -- An ion scattering study, report, October 7, 1997; Illinois. (digital.library.unt.edu/ark:/67531/metadc698178/: accessed September 21, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.