An X-ray photoelectron spectroscopic study of the B-N-Ti system

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Description

Composite nitrides (such as BN, TiN) are widely used in various industrial applications because of their extreme wear and corrosion resistance, thermal and electrical properties. In order to obtain composite materials with these optimal properties, it is important to elucidate whether any chemical reactions occur at nitride/metal interfaces, e.g., those involving BN-Ti/TiN. Materials of interest include the deposition by PVD of Ti and TiN on BN substrates. Some of these systems were then subjected to varying degrees of physical and thermal alteration. Detailed X-ray photoelectron spectroscopy (XPS) has therefore been rendered of these interfaces using cross-sectional display and sputter etching. ... continued below

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9 p.

Creation Information

Seal, S.; Barr, T.L.; Sobczak, N.; Benko, E. & Morgiel, J. March 1, 1997.

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  • Seal, S. Lawrence Berkeley National Lab., CA (United States)
  • Barr, T.L. Univ. of Wisconsin, Milwaukee, WI (United States)
  • Sobczak, N. Foundry Research Inst., Cracow (Poland)
  • Benko, E. Inst. of Metal Cutting, Cracow (Poland)
  • Morgiel, J. Polish Academy of Sciences, Cracow (Poland). Inst. of Metallurgy and Materials Science

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Description

Composite nitrides (such as BN, TiN) are widely used in various industrial applications because of their extreme wear and corrosion resistance, thermal and electrical properties. In order to obtain composite materials with these optimal properties, it is important to elucidate whether any chemical reactions occur at nitride/metal interfaces, e.g., those involving BN-Ti/TiN. Materials of interest include the deposition by PVD of Ti and TiN on BN substrates. Some of these systems were then subjected to varying degrees of physical and thermal alteration. Detailed X-ray photoelectron spectroscopy (XPS) has therefore been rendered of these interfaces using cross-sectional display and sputter etching. Resulting structural and morphological features have been investigated with transmission electron microscopy (TEM) and X-ray diffraction (XRD). Diffusion of the nitridation, oxynitride formation and interfacial growth are of general interest.

Physical Description

9 p.

Notes

OSTI as DE97007896

Source

  • Spring meeting of the Materials Research Society, San Francisco, CA (United States), 31 Mar - 4 Apr 1997

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  • Other: DE97007896
  • Report No.: LBNL--40396
  • Report No.: LSBL--384;CONF-970302--19
  • Grant Number: AC03-76SF00098
  • Office of Scientific & Technical Information Report Number: 521611
  • Archival Resource Key: ark:/67531/metadc697345

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  • March 1, 1997

Added to The UNT Digital Library

  • Aug. 14, 2015, 8:43 a.m.

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  • Aug. 4, 2016, 6:51 p.m.

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Seal, S.; Barr, T.L.; Sobczak, N.; Benko, E. & Morgiel, J. An X-ray photoelectron spectroscopic study of the B-N-Ti system, article, March 1, 1997; California. (digital.library.unt.edu/ark:/67531/metadc697345/: accessed August 23, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.