Sub-wavelength diffractive optics

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Description

This report represents the completion of a three-year Laboratory-Directed Research and Development (LDRD) program to investigate sub-wavelength surface relief structures fabricated by direct-write e-beam technology as unique and very high-efficiency optical elements. A semiconductor layer with sub-wavelength sized etched openings or features can be considered as a layer with an effective index of refraction determined by the fraction of the surface filled with semiconductor relative to the fraction filled with air or other material. Such as a layer can be used to implement planar gradient-index lenses on a surface. Additionally, the nanometer-scale surface structures have diffractive properties that allow the ... continued below

Physical Description

31 p.

Creation Information

Warren, M.E.; Wendt, J.R. & Vawter, G.A. March 1, 1998.

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This report is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. More information about this report can be viewed below.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

This report represents the completion of a three-year Laboratory-Directed Research and Development (LDRD) program to investigate sub-wavelength surface relief structures fabricated by direct-write e-beam technology as unique and very high-efficiency optical elements. A semiconductor layer with sub-wavelength sized etched openings or features can be considered as a layer with an effective index of refraction determined by the fraction of the surface filled with semiconductor relative to the fraction filled with air or other material. Such as a layer can be used to implement planar gradient-index lenses on a surface. Additionally, the nanometer-scale surface structures have diffractive properties that allow the direct manipulation of polarization and altering of the reflective properties of surfaces. With this technology a single direct-write mask and etch can be used to integrate a wide variety of optical functions into a device surface with high efficiencies; allowing for example, direct integration of polarizing optics into the surface with high efficiencies; allowing for example, direct integration of polarizing optics into the surfaces of devices, forming anti-reflection surfaces or fabricating high-efficiency, high-numerical aperture lenses, including integration inside vertical semiconductor laser cavities.

Physical Description

31 p.

Notes

OSTI as DE98002829

Source

  • Other Information: PBD: Mar 1998

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Identifier

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  • Other: DE98002829
  • Report No.: SAND--98-0508
  • Grant Number: AC04-94AL85000
  • DOI: 10.2172/572661 | External Link
  • Office of Scientific & Technical Information Report Number: 572661
  • Archival Resource Key: ark:/67531/metadc692716

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

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Creation Date

  • March 1, 1998

Added to The UNT Digital Library

  • Aug. 14, 2015, 8:43 a.m.

Description Last Updated

  • April 14, 2016, 7:05 p.m.

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Warren, M.E.; Wendt, J.R. & Vawter, G.A. Sub-wavelength diffractive optics, report, March 1, 1998; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc692716/: accessed April 26, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.