Analysis of potential component cleaning techniques. Final report, July 6, 1992--July 5, 1995

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Elevated temperature, elevated pressure water, supercritical carbon dioxide and helical resonator plasmas were investigated for potential use in surface cleaning. A surface analysis system consisting of X-ray Photoelectron Spectroscopy and Auger Electron Spectroscopy was used to evaluate surfaces exposed to water and supercritical carbon dioxide. Langmuir probe and silicon oxidation studies were used to evaluate the effect of oxygen plasmas on silicon surfaces. Silicon oxides were removed from silicon surfaces by water at temperatures above 260{degrees}C and pressures above 2000 psi; silicon oxidation and simultaneous dissolution of the oxide grown occurred under these conditions. A new approach for in-situ monitoring ... continued below

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34 p.

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Hess, D.W. November 1, 1997.

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  • Hess, D.W. Lehigh Univ., Bethlehem, PA (United States)

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Description

Elevated temperature, elevated pressure water, supercritical carbon dioxide and helical resonator plasmas were investigated for potential use in surface cleaning. A surface analysis system consisting of X-ray Photoelectron Spectroscopy and Auger Electron Spectroscopy was used to evaluate surfaces exposed to water and supercritical carbon dioxide. Langmuir probe and silicon oxidation studies were used to evaluate the effect of oxygen plasmas on silicon surfaces. Silicon oxides were removed from silicon surfaces by water at temperatures above 260{degrees}C and pressures above 2000 psi; silicon oxidation and simultaneous dissolution of the oxide grown occurred under these conditions. A new approach for in-situ monitoring of subcritical and supercritical fluid density was devised.

Physical Description

34 p.

Notes

INIS; OSTI as DE98000887

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  • Other Information: PBD: [1997]

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  • Other: DE98000887
  • Report No.: LA-SUB--97-50
  • Grant Number: W-7405-ENG-36
  • DOI: 10.2172/544738 | External Link
  • Office of Scientific & Technical Information Report Number: 544738
  • Archival Resource Key: ark:/67531/metadc689687

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Office of Scientific & Technical Information Technical Reports

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  • November 1, 1997

Added to The UNT Digital Library

  • Aug. 14, 2015, 8:43 a.m.

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  • July 28, 2016, 7:05 p.m.

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Hess, D.W. Analysis of potential component cleaning techniques. Final report, July 6, 1992--July 5, 1995, report, November 1, 1997; New Mexico. (digital.library.unt.edu/ark:/67531/metadc689687/: accessed October 21, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.