Sputter-deposited Be ablators for NIF target capsules

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We have performed a series of preliminary experiments to determine whether sputter deposition of doped Be is a practical route to producing NIF target capsules with Be ablators. Films ranging in thickness from 7 to {approximately} 120 {micro}m have been deposited on spherical polymer mandrels using a bounce pan to ensure uniform coating. With no voltage bias applied to the pan, relatively porous coatings were formed that were highly permeable to hydrogen. The surface finish of these films ranged from {approximately}250 nm rms for 13-{micro}m-thick films to a minimum of {approximately}75 nm rms for an 80-{micro}m-thick film. Application of a ... continued below

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10 p.

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McEachern, R.; Clford, C.; Cook, R.; Makowiecki, E. & Wallace, R. March 26, 1997.

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Description

We have performed a series of preliminary experiments to determine whether sputter deposition of doped Be is a practical route to producing NIF target capsules with Be ablators. Films ranging in thickness from 7 to {approximately} 120 {micro}m have been deposited on spherical polymer mandrels using a bounce pan to ensure uniform coating. With no voltage bias applied to the pan, relatively porous coatings were formed that were highly permeable to hydrogen. The surface finish of these films ranged from {approximately}250 nm rms for 13-{micro}m-thick films to a minimum of {approximately}75 nm rms for an 80-{micro}m-thick film. Application of a voltage bias was found to significantly modify the film morphology. At a bias of 120 V, 7-{micro}m-thick films with a dense, fine-grained microstructure were produced. These capsules had a reflective surface with a 50 nm rms roughness. Finally, to demonstrate the ability to produce a graded dopant profile, a coating was produced in which the concentration of added Cu was varied from 2.5 atom % at the beginning to zero after 40 {micro}m of deposition.

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10 p.

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INIS; OSTI as DE98051138

Other: FDE: PDF; PL:

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  • 11. target fabrication specialist meeting, Orcas Island, WA (United States), 8-12 Sep 1996

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  • Other: DE98051138
  • Report No.: UCRL-JC--127112
  • Report No.: CONF-9609225--
  • Grant Number: W-7405-ENG-48
  • Office of Scientific & Technical Information Report Number: 645373
  • Archival Resource Key: ark:/67531/metadc689564

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  • March 26, 1997

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  • Aug. 14, 2015, 8:43 a.m.

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  • April 6, 2017, 6:28 p.m.

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McEachern, R.; Clford, C.; Cook, R.; Makowiecki, E. & Wallace, R. Sputter-deposited Be ablators for NIF target capsules, article, March 26, 1997; California. (digital.library.unt.edu/ark:/67531/metadc689564/: accessed October 23, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.