Surface Dependent Electron and Negative Ion Density in Inductively Coupled Discharges

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Electron and negative ion density have been measured in a modfied Applied Materials DPS metal etch chamber using gas mixtures of BCl{sub 3}, Cl{sub 2} and Ar. Measurements were performed for four dflerent substrate types to examine the influence of surface material on the bulk plasma properties; aluminurq alumina, photoresist and 50 percent patterned aluminum / photoresist. Electron densities in the Cl{sub 2} / BCl{sub 3} mixtures varied from 0.25 to 4 x 10{sup 11} cm{sup -3}. Photodetachment measurements of the negative ion density indicate that the negative ion density was smaller than the electron density and that the electron ... continued below

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Blain, M.G.; Hamilton, T.W.; Hebner, G.A.; Jarecki, R.L. & Nichols, C.A. January 18, 1999.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Laboratories, Albuquerque, NM, and Livermore, CA
    Place of Publication: Albuquerque, New Mexico

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Electron and negative ion density have been measured in a modfied Applied Materials DPS metal etch chamber using gas mixtures of BCl{sub 3}, Cl{sub 2} and Ar. Measurements were performed for four dflerent substrate types to examine the influence of surface material on the bulk plasma properties; aluminurq alumina, photoresist and 50 percent patterned aluminum / photoresist. Electron densities in the Cl{sub 2} / BCl{sub 3} mixtures varied from 0.25 to 4 x 10{sup 11} cm{sup -3}. Photodetachment measurements of the negative ion density indicate that the negative ion density was smaller than the electron density and that the electron to negative ion density ratio varied between 1 and 6. The presence of photoresist had a dominant intluence on the electron and negative ion density compared to alumina and aluminum surfaces. In most cases, the electron density above wafers covered with photoresist was a factor of two lower while the negative ion density was a factor of two higher than the aluminum or alumina surfaces.

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  • Journal Name: Journal Vacuum Science Technology

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  • Other: DE00003212
  • Report No.: SAND99-0109J
  • Grant Number: AC04-94AL85000
  • Office of Scientific & Technical Information Report Number: 3212
  • Archival Resource Key: ark:/67531/metadc688888

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Office of Scientific & Technical Information Technical Reports

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  • January 18, 1999

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  • July 25, 2015, 2:20 a.m.

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  • Dec. 2, 2016, 2:44 p.m.

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Blain, M.G.; Hamilton, T.W.; Hebner, G.A.; Jarecki, R.L. & Nichols, C.A. Surface Dependent Electron and Negative Ion Density in Inductively Coupled Discharges, article, January 18, 1999; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc688888/: accessed June 19, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.