Stacked insulator induction accelerator gaps

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Description

Stacked insulators, with alternating layers of insulating material and conducting film, have been shown to support high surface electrical field stresses. We have investigated the application of the stacked insulator technology to the design of induction accelerator modules for the Relativistic-Klystron Two-Beam Accelerator program. The rf properties of the accelerating gaps using stacked insulators, particularly the impedance at frequencies above the beam pipe cutoff frequency, are investigated. Low impedance is critical for Relativistic-Klystron Two-Beam Accelerator applications where a high current, bunched beam is trsnsported through many accelerating gaps. An induction accelerator module designs using a stacked insulator is presented.

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6 p.

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Houck, T. I.; Westenskow, G. A.; Kim, J. S.; Eylon, S.; Henestroza, E.; Yu, S. S. et al. May 1997.

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Description

Stacked insulators, with alternating layers of insulating material and conducting film, have been shown to support high surface electrical field stresses. We have investigated the application of the stacked insulator technology to the design of induction accelerator modules for the Relativistic-Klystron Two-Beam Accelerator program. The rf properties of the accelerating gaps using stacked insulators, particularly the impedance at frequencies above the beam pipe cutoff frequency, are investigated. Low impedance is critical for Relativistic-Klystron Two-Beam Accelerator applications where a high current, bunched beam is trsnsported through many accelerating gaps. An induction accelerator module designs using a stacked insulator is presented.

Physical Description

6 p.

Notes

OSTI as DE98050949

Other: FDE: PDF; PL:

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  • 17. IEEE particle accelerator conference, Vancouver (Canada), 12-16 May 1997

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  • Other: DE98050949
  • Report No.: UCRL-JC--127273
  • Report No.: CONF-970503--
  • Grant Number: W-7405-ENG-48
  • Office of Scientific & Technical Information Report Number: 358834
  • Archival Resource Key: ark:/67531/metadc688345

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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  • May 1997

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  • July 25, 2015, 2:20 a.m.

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  • April 6, 2017, 5:55 p.m.

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Houck, T. I.; Westenskow, G. A.; Kim, J. S.; Eylon, S.; Henestroza, E.; Yu, S. S. et al. Stacked insulator induction accelerator gaps, article, May 1997; California. (digital.library.unt.edu/ark:/67531/metadc688345/: accessed April 22, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.