Ion energy distribution functions in inductively coupled RF discharges in mixtures of chlorine and boron trichloride

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Description

Plasma discharges involving mixtures of chlorine and boron trichloride are widely used to etch metals in the production of very-large-scale-integrated circuits. Energetic ions play a critical role in this process, influencing the etch rates, etch profiles, and selectivity to different materials. The authors are using a gridded energy analyzer to measure positive ion energy distributions and fluxes at the grounded electrode of high-density inductively-coupled rf discharges. In this paper, they present details of ion energies and fluxes in discharges containing mixtures of chlorine and boron trichloride.

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11 p.

Creation Information

Woodworth, J.R.; Nichols, C.A. & Hamilton, T.W. February 1, 1997.

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This report is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. More information about this report can be viewed below.

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Authors

  • Woodworth, J.R.
  • Nichols, C.A. Sandia National Labs., Albuquerque, NM (United States). Laser, Optics, and Remote Sensing Dept.
  • Hamilton, T.W. Applied Physics International, Inc., Albuquerque, NM (United States)

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

Plasma discharges involving mixtures of chlorine and boron trichloride are widely used to etch metals in the production of very-large-scale-integrated circuits. Energetic ions play a critical role in this process, influencing the etch rates, etch profiles, and selectivity to different materials. The authors are using a gridded energy analyzer to measure positive ion energy distributions and fluxes at the grounded electrode of high-density inductively-coupled rf discharges. In this paper, they present details of ion energies and fluxes in discharges containing mixtures of chlorine and boron trichloride.

Physical Description

11 p.

Notes

OSTI as DE97002540

Source

  • 2. international symposium on plasma process-induced damage, Monterey, CA (United States), 12-14 May 1997

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  • Other: DE97002540
  • Report No.: SAND--97-0219C
  • Report No.: CONF-970575--1
  • Grant Number: AC04-94AL85000
  • DOI: 10.2172/463640 | External Link
  • Office of Scientific & Technical Information Report Number: 463640
  • Archival Resource Key: ark:/67531/metadc686173

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Creation Date

  • February 1, 1997

Added to The UNT Digital Library

  • July 25, 2015, 2:21 a.m.

Description Last Updated

  • April 13, 2016, 2:41 p.m.

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Woodworth, J.R.; Nichols, C.A. & Hamilton, T.W. Ion energy distribution functions in inductively coupled RF discharges in mixtures of chlorine and boron trichloride, report, February 1, 1997; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc686173/: accessed January 21, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.