A CMOS-compatible, surface-micromachined pressure sensor for aqueous ultrasonic application

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Description

A surface micromachined pressure sensor array is under development at the Integrated Micromechanics, Microsensors, and CMOS Technologies organization at Sandia National Laboratories. This array is designed to sense absolute pressures from ambient pressure to 650 psia with frequency responses from DC to 2 MHz. The sensor is based upon a sealed, deformable, circular LPCVD silicon nitride diaphragm. Absolute pressure is determined from diaphragm deflection, which is sensed with low-stress, micromechanical, LPCVD polysilicon piezoresistors. All materials and processes used for sensor fabrication are CMOS compatible, and are part of Sandia`s ongoing effort of CMOS integration with Micro-ElectroMechanical Systems (MEMS). Test results ... continued below

Physical Description

8 p.

Creation Information

Eaton, W. P. & Smith, J. H. December 1994.

Context

This article is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. More information about this article can be viewed below.

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Authors

  • Eaton, W. P. New Mexico, Albuquerque, NM (United States)
  • Smith, J. H. Sandia National Labs., Albuquerque, NM (United States)

Publisher

  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

A surface micromachined pressure sensor array is under development at the Integrated Micromechanics, Microsensors, and CMOS Technologies organization at Sandia National Laboratories. This array is designed to sense absolute pressures from ambient pressure to 650 psia with frequency responses from DC to 2 MHz. The sensor is based upon a sealed, deformable, circular LPCVD silicon nitride diaphragm. Absolute pressure is determined from diaphragm deflection, which is sensed with low-stress, micromechanical, LPCVD polysilicon piezoresistors. All materials and processes used for sensor fabrication are CMOS compatible, and are part of Sandia`s ongoing effort of CMOS integration with Micro-ElectroMechanical Systems (MEMS). Test results of individual sensors are presented along with process issues involving the release etch and metal step coverage.

Physical Description

8 p.

Notes

OSTI as DE95008538

Source

  • North American conference on smart structures and materials, San Diego, CA (United States), 26 Feb - 3 Mar 1995

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  • Other: DE95008538
  • Report No.: SAND--94-2146C
  • Report No.: CONF-950228--2
  • Grant Number: AC04-94AL85000
  • Office of Scientific & Technical Information Report Number: 34467
  • Archival Resource Key: ark:/67531/metadc685848

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Creation Date

  • December 1994

Added to The UNT Digital Library

  • July 25, 2015, 2:20 a.m.

Description Last Updated

  • Nov. 19, 2015, 3:48 p.m.

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Eaton, W. P. & Smith, J. H. A CMOS-compatible, surface-micromachined pressure sensor for aqueous ultrasonic application, article, December 1994; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc685848/: accessed September 23, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.