Multilayer reflective coatings for extreme-ultraviolet lithography

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Multilayer mirror coatings which reflect extreme ultraviolet (EUV) radiation are a key enabling technology for EUV lithography. Mo/Si multilayers with reflectances of 67.5% at 13.4 nm are now routinely achieved and reflectances of 70 2% at 11.4 nm were obtained with MO/Be multilayers. High reflectance is achieved with careful control of substrate quality, layer thicknesses, multilayer materials, interface quality, and surface termination. Reflectance and film stress were found to be stable relative to the requirements for application to EUV lithography. The run-to-run reproducibility of the reflectance peak position was characterized to be better than 0.2%, providing the required wavelength matching ... continued below

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13 p.

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Montcalm, C., LLNL March 10, 1998.

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Multilayer mirror coatings which reflect extreme ultraviolet (EUV) radiation are a key enabling technology for EUV lithography. Mo/Si multilayers with reflectances of 67.5% at 13.4 nm are now routinely achieved and reflectances of 70 2% at 11.4 nm were obtained with MO/Be multilayers. High reflectance is achieved with careful control of substrate quality, layer thicknesses, multilayer materials, interface quality, and surface termination. Reflectance and film stress were found to be stable relative to the requirements for application to EUV lithography. The run-to-run reproducibility of the reflectance peak position was characterized to be better than 0.2%, providing the required wavelength matching among the seven multilayer-coated mirrors used in the present lithography system design. Uniformity of coating was improved to better than 0.5% across 150 mm diameter substrates. These improvements in EUV multilayer mirror technology will enable us to meet the stringent specifications for coating the large optical substrates for our next-generation EUV lithography system.

Physical Description

13 p.

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OSTI as DE98058759

Other: FDE: PDF; PL:

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  • 23. SPIE annual international symposium on microlithography conference, Santa Clara, CA (United States), 22-27 Feb 1998

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  • Other: DE98058759
  • Report No.: UCRL-JC--128289
  • Report No.: CONF-980225--
  • Grant Number: W-7405-ENG-48
  • Office of Scientific & Technical Information Report Number: 310916
  • Archival Resource Key: ark:/67531/metadc685508

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  • March 10, 1998

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  • July 25, 2015, 2:20 a.m.

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  • April 10, 2017, 1:29 p.m.

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Montcalm, C., LLNL. Multilayer reflective coatings for extreme-ultraviolet lithography, article, March 10, 1998; California. (digital.library.unt.edu/ark:/67531/metadc685508/: accessed December 12, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.