Pulsed laser deposition: Prospects for commercial deposition of epitaxial films

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Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique for the deposition of thin films. The vapor source is induced by the flash evaporation that occurs when a laser pulse of sufficient intensity (about 100 MW/cm{sup 2}) is absorbed by a target. In this paper the author briefly defines pulsed laser deposition, current applications, research directed at gaining a better understanding of the pulsed laser deposition process, and suggests some future directions to enable commercial applications.

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8 p.

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Muenchausen, R.E. March 1, 1999.

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Description

Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique for the deposition of thin films. The vapor source is induced by the flash evaporation that occurs when a laser pulse of sufficient intensity (about 100 MW/cm{sup 2}) is absorbed by a target. In this paper the author briefly defines pulsed laser deposition, current applications, research directed at gaining a better understanding of the pulsed laser deposition process, and suggests some future directions to enable commercial applications.

Physical Description

8 p.

Notes

OSTI as DE99002067

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  • SPIE`s international symposium on high-power laser ablation, Santa Fe, NM (United States), 26-30 Apr 1998

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  • Other: DE99002067
  • Report No.: LA-UR--99-3109
  • Report No.: CONF-980447--
  • Grant Number: W-7405-ENG-36
  • Office of Scientific & Technical Information Report Number: 325782
  • Archival Resource Key: ark:/67531/metadc684950

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  • March 1, 1999

Added to The UNT Digital Library

  • July 25, 2015, 2:20 a.m.

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  • May 5, 2016, 7:35 p.m.

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Muenchausen, R.E. Pulsed laser deposition: Prospects for commercial deposition of epitaxial films, article, March 1, 1999; New Mexico. (digital.library.unt.edu/ark:/67531/metadc684950/: accessed September 23, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.