Mechanistic studies of SC-1 particle removal and post piranha rinsing

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SC-1 (NH{sub 4}OH/H{sub 2}O{sub 2}/H{sub 2}O) and piranha (H{sub 2}SO{sub 4}/H{sub 2}O{sub 2}) cleans have been used for many years to remove particulate and organic contamination. Although the SC-1 clean, often used with applied megasonic power, is known to be highly effective for particle removal, the removal mechanism remains unclear. For the removal of heavy organic contamination, the piranha cleaning chemistry is an effective process; however, post-piranha residue adheres tenaciously to the wafer surface, causing a particle growth phenomenon. A series of experiments have been performed to help understand the interaction of these processes with silicon surfaces.

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5 p.

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Resnick, P.; Adkins, C.; Clews, P.; Matlock, C.; Kittelson, D.; Kuehn, T. et al. October 1, 1996.

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This article is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. It has been viewed 37 times . More information about this article can be viewed below.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM (United States)
    Place of Publication: Albuquerque, New Mexico

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SC-1 (NH{sub 4}OH/H{sub 2}O{sub 2}/H{sub 2}O) and piranha (H{sub 2}SO{sub 4}/H{sub 2}O{sub 2}) cleans have been used for many years to remove particulate and organic contamination. Although the SC-1 clean, often used with applied megasonic power, is known to be highly effective for particle removal, the removal mechanism remains unclear. For the removal of heavy organic contamination, the piranha cleaning chemistry is an effective process; however, post-piranha residue adheres tenaciously to the wafer surface, causing a particle growth phenomenon. A series of experiments have been performed to help understand the interaction of these processes with silicon surfaces.

Physical Description

5 p.

Notes

OSTI as DE96014489

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  • 3. bi-annual international symposium on ultra clean processing of silicon surfaces, Antwerp (Belgium), 23-25 Sep 1996

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  • Other: DE96014489
  • Report No.: SAND--96-2167C
  • Report No.: CONF-9609107--3
  • Grant Number: AC04-94AL85000
  • Office of Scientific & Technical Information Report Number: 378811
  • Archival Resource Key: ark:/67531/metadc682721

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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  • October 1, 1996

Added to The UNT Digital Library

  • July 25, 2015, 2:20 a.m.

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  • April 13, 2016, 2:57 p.m.

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Resnick, P.; Adkins, C.; Clews, P.; Matlock, C.; Kittelson, D.; Kuehn, T. et al. Mechanistic studies of SC-1 particle removal and post piranha rinsing, article, October 1, 1996; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc682721/: accessed October 23, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.