Release-etch modeling for complex surface micromachined structures

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Description

A release etch model for etching sacrificial oxides in aqueous HF solutions is presented. This model is an extension of work done by Monk et al. and Liu et al. The model is inherently one dimensional, but can be used to model the etching of complex three dimensional parts. Solutions and boundary conditions are presented for a number of geometries. Knowledge of release-etch kinetics is essential for designing manufacturing processes for large surface micromachined structures such as sealed diaphragms and cavities and flow channels.

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15 p.

Creation Information

Eaton, W.P.; Smith, J.H. & Jarecki, R.L. October 1, 1996.

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This article is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. More information about this article can be viewed below.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

A release etch model for etching sacrificial oxides in aqueous HF solutions is presented. This model is an extension of work done by Monk et al. and Liu et al. The model is inherently one dimensional, but can be used to model the etching of complex three dimensional parts. Solutions and boundary conditions are presented for a number of geometries. Knowledge of release-etch kinetics is essential for designing manufacturing processes for large surface micromachined structures such as sealed diaphragms and cavities and flow channels.

Physical Description

15 p.

Notes

OSTI as DE96014842

Source

  • SPIE conference on micromachining and microfabrication, Austin, TX (United States), 14-15 Oct 1996

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  • Other: DE96014842
  • Report No.: SAND--96-2012C
  • Report No.: CONF-961086--4
  • Grant Number: AC04-94AL85000
  • Office of Scientific & Technical Information Report Number: 378810
  • Archival Resource Key: ark:/67531/metadc681436

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

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  • October 1, 1996

Added to The UNT Digital Library

  • July 25, 2015, 2:20 a.m.

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  • April 13, 2016, 6:48 p.m.

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Citations, Rights, Re-Use

Eaton, W.P.; Smith, J.H. & Jarecki, R.L. Release-etch modeling for complex surface micromachined structures, article, October 1, 1996; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc681436/: accessed November 22, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.