Modeling of Thermal, Electronic, Hydrodynamic, And Dynamic Deposition Processes for Pulsed-Laser Deposition of Thin Films Page: 1 of 9
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MODELING OF THERMAL, ELECTRONIC, HYDRODYNAMIC, AND
DYNAMIC DEPOSITION PROCESSES FOR PULSED-LASER DEPOSITION
OF THIN FILMS
C. L. Liu, J. N. LeBoeuf, R. F. Wood, D. B. Geohegan, J. M. Donato,
K. R. Chen, and A. A. Puretzky
Solid State Division, Oak Ridge National Laboratory
P.O. Box 2008, Oak Ridge, Tennessee 37831-6030
-1he submitted manuscript has been authored
by a contractor of the U.S. Government under
contract No. DE-ACOS-840R21400.
Accordingly, the U.S. Government retainsi a
nonexclusive, royalty-free license to publish or
reproduce the published form of this
contribution, or allow others to do so, for U.S.
Government purpose."SOLID STATE DIVISION
OAK RIDGE NATIONAL LABORATORY
Managed by
MARTIN MARIETTA ENERGY SYSTEMS, INC.
under
Contract No. DE-AC05-84OR21400
with the
U.S. DEPARTMENT OF ENERGY
Oak Ridge, Tennessee
November 1994DISTRIBUTION OF THIS DOCUMENT IS UNUM T
To be presented at Fall Meeting of the Materials Research Society,
Boston, MA, November 28-December 28, 1994 and published in
Beam-Solid Interactions for Materials Synthesis and Characterization,
ed. by D. E. Luzzi, T. F. Heinz, M. Iwaki, and D. C. Jacobson,
Materials Research Society, Pittsburgh, PANote: This is a draft of a paper submitted for publication. Contents of this
paper should not be quoted or referred to without permission of the author(s).
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Liu, C. L.; LeBoeuf, J. N.; Wood, R. F.; Geohegan, D. B.; Donato, J. M.; Chen, K. R. et al. Modeling of Thermal, Electronic, Hydrodynamic, And Dynamic Deposition Processes for Pulsed-Laser Deposition of Thin Films, article, November 1, 1994; Tennessee. (https://digital.library.unt.edu/ark:/67531/metadc680503/m1/1/: accessed April 25, 2024), University of North Texas Libraries, UNT Digital Library, https://digital.library.unt.edu; crediting UNT Libraries Government Documents Department.