CVD diamond substrate for microelectronics. Final report

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Description

Chemical Vapor Deposition (CVD) of diamond films has evolved dramatically in recent years, and commercial opportunities for diamond substrates in thermal management applications are promising. The objective of this technology transfer initiative (TTI) is for Applied Science and Technology, Inc. (ASTEX) and AlliedSignal Federal Manufacturing and Technologies (FM&T) to jointly develop and document the manufacturing processes and procedures required for the fabrication of multichip module circuits using CVD diamond substrates, with the major emphasis of the project concentrating on lapping/polishing prior to metallization. ASTEX would provide diamond films for the study, and FM&T would use its experience in lapping, polishing, ... continued below

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7 p.

Creation Information

Burden, J. & Gat, R. November 1, 1996.

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This report is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. It has been viewed 32 times . More information about this report can be viewed below.

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  • Burden, J. Allied Signal, Inc., Kansas City, MO (United States). Federal Mfg. and Technologies
  • Gat, R. Applied Science and Technology, Inc., Woburn, MA (United States)

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Description

Chemical Vapor Deposition (CVD) of diamond films has evolved dramatically in recent years, and commercial opportunities for diamond substrates in thermal management applications are promising. The objective of this technology transfer initiative (TTI) is for Applied Science and Technology, Inc. (ASTEX) and AlliedSignal Federal Manufacturing and Technologies (FM&T) to jointly develop and document the manufacturing processes and procedures required for the fabrication of multichip module circuits using CVD diamond substrates, with the major emphasis of the project concentrating on lapping/polishing prior to metallization. ASTEX would provide diamond films for the study, and FM&T would use its experience in lapping, polishing, and substrate metallization to perform secondary processing on the parts. The primary goal of the project was to establish manufacturing processes that lower the manufacturing cost sufficiently to enable broad commercialization of the technology.

Physical Description

7 p.

Notes

OSTI as DE97051085

Source

  • Other Information: PBD: Nov 1996

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  • Other: DE97051085
  • Report No.: KCP--613-5859
  • Grant Number: AC04-76DP00613
  • DOI: 10.2172/436418 | External Link
  • Office of Scientific & Technical Information Report Number: 436418
  • Archival Resource Key: ark:/67531/metadc679543

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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Creation Date

  • November 1, 1996

Added to The UNT Digital Library

  • July 25, 2015, 2:20 a.m.

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  • Dec. 7, 2015, 10:36 a.m.

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Burden, J. & Gat, R. CVD diamond substrate for microelectronics. Final report, report, November 1, 1996; United States. (digital.library.unt.edu/ark:/67531/metadc679543/: accessed November 14, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.