Precision manufacturing using advanced optical interference lithography. Final report

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Description

Goal was to develop interference lithography (IL) as a reliable process for patterning large-area, deep-submicron scale field emission arrays for field emission display (FED) applications. We have developed a system based on IL which can easily produce an array of 0.2-0.5 micron emitters over large area (up to 400 sq. in. to date) with better than 5% height and spacing uniformity. Process development as a result of this LDRD project represents a significant advance over the current state of the art for FED manufacturing and is applicable to all types of FEDs, independent of the emitter material. Ability of IL ... continued below

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12 p.

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Britten, J.A. & Hawryluk, A.M. April 3, 1997.

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Description

Goal was to develop interference lithography (IL) as a reliable process for patterning large-area, deep-submicron scale field emission arrays for field emission display (FED) applications. We have developed a system based on IL which can easily produce an array of 0.2-0.5 micron emitters over large area (up to 400 sq. in. to date) with better than 5% height and spacing uniformity. Process development as a result of this LDRD project represents a significant advance over the current state of the art for FED manufacturing and is applicable to all types of FEDs, independent of the emitter material. Ability of IL to pattern such structures simultaneously and uniformly on a large format has application to other technology areas, such as dynamic random access memory (DRAM) production and magnetic media recording.

Physical Description

12 p.

Notes

OSTI as DE97053126

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  • Other Information: PBD: 3 Apr 1997

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  • Other: DE97053126
  • Report No.: UCRL-ID--127161
  • Grant Number: W-7405-ENG-48
  • DOI: 10.2172/491960 | External Link
  • Office of Scientific & Technical Information Report Number: 491960
  • Archival Resource Key: ark:/67531/metadc678213

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

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Creation Date

  • April 3, 1997

Added to The UNT Digital Library

  • July 25, 2015, 2:21 a.m.

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  • Feb. 17, 2016, 3:32 p.m.

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Britten, J.A. & Hawryluk, A.M. Precision manufacturing using advanced optical interference lithography. Final report, report, April 3, 1997; California. (digital.library.unt.edu/ark:/67531/metadc678213/: accessed December 11, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.