Morphology and microstructure of (111) crystalline CeO{sub 2} films grown on amorphous SiO{sub 2} substrates by pulsed-laser ablation

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The surface morphology and microstructure of (111)-oriented CeO{sub 2} thin films, grown on amorphous fused silica (SiO{sub 2} substrates by low-energy-ion-beam assisted pulsed laser ablation, have been studied by atomic force microscopy (AFM) and x-ray diffraction (XRD). These CeO{sub 2} films are aligned with respect to a single in-plane axis despite being deposited on an amorphous substrate. There is a honeycomb-like growth morphology to the films and island-growth can be observed in thicker films. These islands, inside of which are high density of honeycomb-like clusters, are separated by a void network with {approximately}700 nm width. However, on the surface of ... continued below

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6 p.

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Zhu, S.; Lowndes, D.H.; Budai, J.D.; Thundat, T.; Norton, D.P. & Warmack, R.J. November 1, 1994.

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The surface morphology and microstructure of (111)-oriented CeO{sub 2} thin films, grown on amorphous fused silica (SiO{sub 2} substrates by low-energy-ion-beam assisted pulsed laser ablation, have been studied by atomic force microscopy (AFM) and x-ray diffraction (XRD). These CeO{sub 2} films are aligned with respect to a single in-plane axis despite being deposited on an amorphous substrate. There is a honeycomb-like growth morphology to the films and island-growth can be observed in thicker films. These islands, inside of which are high density of honeycomb-like clusters, are separated by a void network with {approximately}700 nm width. However, on the surface of the thinnest film ({approximately}3 nm), only very small clusters (diameter <60 nm) appear, and the boundaries of the void network are undefined, which implies that the film is just beginning to coalesce into clusters (grains). The combined AFM images and XRD pattern suggest these clusters probably are the initial seeds for the subsequent island growth. Based on these results, the growth mechanism of oriented CeO{sub 2} films on amorphous fused silica substrates is discussed.

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6 p.

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OSTI as DE95008842

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  • Fall meeting of the Materials Research Society (MRS), Boston, MA (United States), 28 Nov - 9 Dec 1994

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  • Other: DE95008842
  • Report No.: CONF-941144--110
  • Grant Number: AC05-84OR21400
  • Office of Scientific & Technical Information Report Number: 37751
  • Archival Resource Key: ark:/67531/metadc676935

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  • November 1, 1994

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Zhu, S.; Lowndes, D.H.; Budai, J.D.; Thundat, T.; Norton, D.P. & Warmack, R.J. Morphology and microstructure of (111) crystalline CeO{sub 2} films grown on amorphous SiO{sub 2} substrates by pulsed-laser ablation, article, November 1, 1994; Tennessee. (digital.library.unt.edu/ark:/67531/metadc676935/: accessed April 21, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.