Sensor Driven Intelligent Control System For Plasma Processing

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Description

This Cooperative Research and Development Agreement (CRADA) between Innovative Computing Technologies, Inc. (IC Tech) and Martin Marietta Energy Systems (MMES) was undertaken to contribute to improved process control for microelectronic device fabrication. Process data from an amorphous silicon thin film deposition experiment was acquired to validate the performance of an intelligent, adaptive, neurally-inspired control software module designed to provide closed loop control of plasma processing machines used in the microelectronics industry. Data acquisition software was written using LabView The data was collected from an inductively coupled plasma (ICP) source, which was available for this project through LMES's RF/Microwave Technology Center. ... continued below

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19 p.

Creation Information

Bell, G. & Campbell, V.B. February 23, 1998.

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Description

This Cooperative Research and Development Agreement (CRADA) between Innovative Computing Technologies, Inc. (IC Tech) and Martin Marietta Energy Systems (MMES) was undertaken to contribute to improved process control for microelectronic device fabrication. Process data from an amorphous silicon thin film deposition experiment was acquired to validate the performance of an intelligent, adaptive, neurally-inspired control software module designed to provide closed loop control of plasma processing machines used in the microelectronics industry. Data acquisition software was written using LabView The data was collected from an inductively coupled plasma (ICP) source, which was available for this project through LMES's RF/Microwave Technology Center. Experimental parameters measured were RF power, RF current and voltage on the antenna delivering power to the plasma, hydrogen and silane flow rate, chamber pressure, substrate temperature and H-alpha optical emission. Experimental results obtained were poly-crystallin silicon deposition rate, crystallinity, crystallographic orientation and electrical conductivity. Owing to experimental delays resulting from hardware failures, it was not possible to assemble a complete data for IC Tech use within the time and resource constraints of the CRADA. IC Tech was therefore not able to verify the performance of their existing models and control structures and validate model performance under this CRADA.

Physical Description

19 p.

Notes

OSTI as DE00004286

Medium: P; Size: 19 pages

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  • Other Information: PBD: 23 Feb 1998

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  • Report No.: Y/AMT-615
  • Report No.: Crada Number Y-1296-0430
  • Grant Number: AC05-84OR21400
  • DOI: 10.2172/4286 | External Link
  • Office of Scientific & Technical Information Report Number: 4286
  • Archival Resource Key: ark:/67531/metadc676838

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  • February 23, 1998

Added to The UNT Digital Library

  • July 25, 2015, 2:20 a.m.

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  • April 7, 2017, 4:31 p.m.

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Bell, G. & Campbell, V.B. Sensor Driven Intelligent Control System For Plasma Processing, report, February 23, 1998; United States. (digital.library.unt.edu/ark:/67531/metadc676838/: accessed September 21, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.