Surface characterization of optics for EUV lithography

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Description

The surface topography of optics fabricated for Extreme Ultraviolet Lithography has been measured using a combination of phase-measuring interferometry and atomic force microscopy. Power Spectral Densities were computed over spatial frequencies extending from 2.0{times}10{sup {minus}8} nm{sup {minus}1} to 7.7{times}10{sup {minus}2} nm{sup {minus}1}. Roughness values for frequencies greater than 1.0{times}10{sup {minus}6} were 0.64 nm rms for a spherical optic and 0.95 nm rms for an aspheric optic. These values are significantly larger than 0.088 nm rms, which as obtained using a spherical optic representative of current limits in surface polishing technology. 9 refs., 4 figs.

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6 p.

Creation Information

Gaines, D.P.; Sweeney, D.W.; DeLong, K.W.; Vernon, S.P.; Baker, S.L.; Tichenor, D.A. et al. May 28, 1996.

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Description

The surface topography of optics fabricated for Extreme Ultraviolet Lithography has been measured using a combination of phase-measuring interferometry and atomic force microscopy. Power Spectral Densities were computed over spatial frequencies extending from 2.0{times}10{sup {minus}8} nm{sup {minus}1} to 7.7{times}10{sup {minus}2} nm{sup {minus}1}. Roughness values for frequencies greater than 1.0{times}10{sup {minus}6} were 0.64 nm rms for a spherical optic and 0.95 nm rms for an aspheric optic. These values are significantly larger than 0.088 nm rms, which as obtained using a spherical optic representative of current limits in surface polishing technology. 9 refs., 4 figs.

Physical Description

6 p.

Notes

OSTI as DE96013884

Source

  • Optical Society of America (OSA) meeting on integrated photonics research, Boston, MA (United States), 29 Apr - 3 May 1996

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  • Other: DE96013884
  • Report No.: UCRL-JC--123042
  • Report No.: CONF-960493--16
  • Grant Number: W-7405-ENG-48
  • DOI: 10.2172/378184 | External Link
  • Office of Scientific & Technical Information Report Number: 378184
  • Archival Resource Key: ark:/67531/metadc675715

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  • May 28, 1996

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  • July 25, 2015, 2:20 a.m.

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  • Feb. 23, 2016, 12:36 p.m.

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Gaines, D.P.; Sweeney, D.W.; DeLong, K.W.; Vernon, S.P.; Baker, S.L.; Tichenor, D.A. et al. Surface characterization of optics for EUV lithography, report, May 28, 1996; California. (digital.library.unt.edu/ark:/67531/metadc675715/: accessed September 20, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.