Hazards and controls at the Sandia National Laboratories microelectronics development laboratory Metadata

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Title

  • Main Title Hazards and controls at the Sandia National Laboratories microelectronics development laboratory

Creator

  • Author: Benton, M.A.
    Creator Type: Personal

Contributor

  • Sponsor: United States. Department of Energy.
    Contributor Type: Organization
    Contributor Info: USDOE, Washington, DC (United States)

Publisher

  • Name: Sandia National Laboratories
    Place of Publication: Albuquerque, New Mexico
    Additional Info: Sandia National Labs., Albuquerque, NM (United States)

Date

  • Creation: 1997-03-01

Language

  • English

Description

  • Content Description: The Microelectronics Development Laboratory (MDL) contains 3,000 m{sup 2}, Which includes 1,000 m{sup 2}of Class I clean room space. There are 20 laminar flow Class I clean room bays. The MDL supplies several, full-flow process technologies which produce complementary metal oxide semiconductor (CMOS) integrated circuits using 150 nun diameter silicon wafers. All gases, chemicals and physical hazards used in the fabrication processes are controlled to levels well below regulatory requirements. Facility engineering controls in the MDL include toxic and pyrophoric gas monitoring, interlocks, ventilation, substitution and chemical segregation. Toxic and pyrophoric gases are monitored continuously inside processing tools as well as through the exhaust lines, gas cabinets, the valve boxes, and in general work areas. The toxic gas monitoring systems are interlocked to gas shutoff valves and have both low and high level alarms. In-use process gases are stored in exhausted cabinets. All chemicals and gases are segregated by chemical type. The processes are organized into eight sector areas that consist of photolithography, wet processes, dry etch, ion implant, metals, diffusion, chemical vapor deposition (CVD) and chemical mechanical polishing (CW). Each morning, engineering, safety and facilities personnel meet to review the equipment and wafer lot status and discuss processing issues. Hazards are assessed in the MDL with periodic walkthroughs, continuous toxic and pyrophoric gas monitoring and personal monitoring. All chemicals and gases proposed for use in the MDL are reviewed by the industrial hygienist and must be approved by a manager before they are purchased. All new equipment and processes are reviewed by a hazard and barrier committee and cannot be used in the MDL without the committee`s approval and an IH hazard assessment. Overall risk of operating the MDL has been reduced to a level that is as low as reasonable achievable for this research facility.
  • Physical Description: 5 p.

Subject

  • Keyword: Human Factors Engineering
  • Keyword: Working Conditions
  • STI Subject Categories: 57 Health And Safety
  • Keyword: Manufacturing
  • Keyword: Health Hazards
  • Keyword: Occupational Safety
  • Keyword: Integrated Circuits
  • Keyword: Laboratories
  • STI Subject Categories: 42 Engineering Not Included In Other Categories

Source

  • Conference: 1997 Semiconductor Safety Association annual conference, Orlalndo, FL (United States), 1-4 Apr 1997

Collection

  • Name: Office of Scientific & Technical Information Technical Reports
    Code: OSTI

Institution

  • Name: UNT Libraries Government Documents Department
    Code: UNTGD

Resource Type

  • Article

Format

  • Text

Identifier

  • Other: DE97002535
  • Report No.: SAND--97-0242C
  • Report No.: CONF-970474--1
  • Grant Number: AC04-94AL85000
  • Office of Scientific & Technical Information Report Number: 462891
  • Archival Resource Key: ark:/67531/metadc675631

Note

  • Display Note: OSTI as DE97002535