Novel near-field optical probe for 100-nm critical dimension measurements

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Description

Although the theoretical resolution for a conventional optical microscope is about 300 nm, it is normally difficult to obtain satisfactory critical dimension (CD) measurements below about 600 nm. E-beam technology has been popular for sub-500 nm metrology but also has well known limitations. Scanning probe and near-field optical methods have high spatial resolution. Yet they are ill-suited for routine CD metrology of high aspect ratio features because of a combination of short working distances (< 10 nm) and large tips. In this paper the authors present the concept and initial modeling results for a novel near-field optical probe that has ... continued below

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9 p.

Creation Information

Stallard, B.R. & Kaushik, S. June 1, 1997.

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Authors

  • Stallard, B.R. Sandia National Labs., Albuquerque, NM (United States)
  • Kaushik, S. Massachusetts Inst. of Tech., Lexington, MA (United States). Lincoln Lab.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

Although the theoretical resolution for a conventional optical microscope is about 300 nm, it is normally difficult to obtain satisfactory critical dimension (CD) measurements below about 600 nm. E-beam technology has been popular for sub-500 nm metrology but also has well known limitations. Scanning probe and near-field optical methods have high spatial resolution. Yet they are ill-suited for routine CD metrology of high aspect ratio features because of a combination of short working distances (< 10 nm) and large tips. In this paper the authors present the concept and initial modeling results for a novel near-field optical probe that has the potential of overcoming these limitations. The idea is to observe resonance shifts in a waveguide cavity that arise from the coupling of the evanescent field of the waveguide to perturbations beneath the waveguide plane. The change in resonance frequency is detected as a change in the transmission of a monochromatic probe beam through the waveguide. The transmitted intensity, together with the appropriate signal processing, gives the topography of the perturbation. The model predicts that this probe is capable of determining the width of photoresist lines as small as 100 nm. The working distance is much more practical than other probe techniques at about 100 to 250 nm.

Physical Description

9 p.

Notes

OSTI as DE97007429

Source

  • 22. SPIE annual international symposium on microlithography, Santa Clara, CA (United States), 9-14 Mar 1997

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Identifier

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  • Other: DE97007429
  • Report No.: SAND--97-1147C
  • Report No.: CONF-970363--2
  • Grant Number: AC04-94AL85000
  • DOI: 10.2172/486169 | External Link
  • Office of Scientific & Technical Information Report Number: 486169
  • Archival Resource Key: ark:/67531/metadc675407

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Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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Creation Date

  • June 1, 1997

Added to The UNT Digital Library

  • July 25, 2015, 2:21 a.m.

Description Last Updated

  • April 13, 2016, 4:05 p.m.

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Stallard, B.R. & Kaushik, S. Novel near-field optical probe for 100-nm critical dimension measurements, report, June 1, 1997; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc675407/: accessed November 23, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.