Acid-base properties, deactivation, and in situ regeneration of condensation catalysts for synthesis of methyl methacrylate

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Condensation reaction of a propionate with formaldehyde is a novel route for synthesis of methyl methacrylate (MMA). The reaction mechanism involves a proton abstraction from the propionate on the basic sites and activation of the aliphatic aldehyde on the acidic sites of the catalyst. The acid-base properties of ternary V-Si-P oxide catalysts and their relation to the NWA yield in the vapor phase condensation of formaldehyde with propionic anhydride has been studied for the first time. Five different V-Si-P catalysts with different atomic ratios of vanadium, silicon, and phosphorous were synthesized, characterized, and tested in a fixed-bed microreactor system. A ... continued below

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6 p.

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Gogate, M.R.; Spivey, J.J. & Zoeller, J.R. December 31, 1996.

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This report is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. It has been viewed 13 times . More information about this report can be viewed below.

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  • Gogate, M.R.
  • Spivey, J.J. Reseach Triangle Institute, Research Triangle Institute, Research Triangle Park, NC (United States)
  • Zoeller, J.R. Eastman Chemical Co., Kingsport, TN (United States)

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Description

Condensation reaction of a propionate with formaldehyde is a novel route for synthesis of methyl methacrylate (MMA). The reaction mechanism involves a proton abstraction from the propionate on the basic sites and activation of the aliphatic aldehyde on the acidic sites of the catalyst. The acid-base properties of ternary V-Si-P oxide catalysts and their relation to the NWA yield in the vapor phase condensation of formaldehyde with propionic anhydride has been studied for the first time. Five different V-Si-P catalysts with different atomic ratios of vanadium, silicon, and phosphorous were synthesized, characterized, and tested in a fixed-bed microreactor system. A V-Si-P 1:10:2.8 catalyst gave the maximum condensation yield of 56% based on HCHO fed at 300{degrees}C and 2 atm and at a space velocity of 290 cc/g cat{center_dot}h. A parameter called the ``q-ratio`` has been defined to correlate the condensation yields to the acid-base properties. The correlation of q-ratio with the condensation yield shows that higher q-ratios are more desirable. The long-term deactivation studies on the V-Si-P 1: 10:2.8 catalyst at 300{degrees}C and 2 atm and at a space velocity of 290 cc/g cat{center_dot}h show that the catalyst activity drops by a factor of nearly 20 over a 180 h period. The activity can be restored to about 78% of the initial activity by a mild oxidative regeneration at 300{degrees}C and 2 atm. The performance of V-Si-P catalyst has been compared to a Ta/SiO{sub 2} catalyst. The Ta- catalyst is more stable and has a higher on-stream catalyst life.

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6 p.

Notes

OSTI as DE97003196

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  • 13. annual international Pittsburgh coal conference, Pittsburgh, PA (United States), 3-7 Sep 1996

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  • Other: DE97003196
  • Report No.: CONF-960954--7
  • Grant Number: AC22-94PC94065
  • DOI: 10.2172/459312 | External Link
  • Office of Scientific & Technical Information Report Number: 459312
  • Archival Resource Key: ark:/67531/metadc675297

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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Creation Date

  • December 31, 1996

Added to The UNT Digital Library

  • July 25, 2015, 2:21 a.m.

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  • Nov. 10, 2015, 8:22 p.m.

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Gogate, M.R.; Spivey, J.J. & Zoeller, J.R. Acid-base properties, deactivation, and in situ regeneration of condensation catalysts for synthesis of methyl methacrylate, report, December 31, 1996; United States. (digital.library.unt.edu/ark:/67531/metadc675297/: accessed July 18, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.