Plasma source ion implantation research and applications at Los Alamos National Laboratory

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Plasma Source Ion Implantation research at Los Alamos Laboratory includes direct investigation of the plasma and materials science involved in target surface modification, numerical simulations of the implantation process, and supporting hardware engineering. Target materials of Al, Cr, Cu-Zn, Mg, Ni, Si, Ti, W, and various Fe alloys have been processed using plasmas produced from Ar, NH{sub 3}, N{sub 2}, CH{sub 4}, and C{sub 2}H{sub 2} gases. Individual targets with surface areas as large as {approximately}4 m{sup 2}, or weighing up to 1200 kg, have been treated in the large LANL facility. In collaboration with General Motors and the University ... continued below

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5 p.

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Munson, C.P.; Faehl, R.J. & Henins, I. December 31, 1996.

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Description

Plasma Source Ion Implantation research at Los Alamos Laboratory includes direct investigation of the plasma and materials science involved in target surface modification, numerical simulations of the implantation process, and supporting hardware engineering. Target materials of Al, Cr, Cu-Zn, Mg, Ni, Si, Ti, W, and various Fe alloys have been processed using plasmas produced from Ar, NH{sub 3}, N{sub 2}, CH{sub 4}, and C{sub 2}H{sub 2} gases. Individual targets with surface areas as large as {approximately}4 m{sup 2}, or weighing up to 1200 kg, have been treated in the large LANL facility. In collaboration with General Motors and the University of Wisconsin, a process has been developed for application of hard, low friction, diamond-like-carbon layers on assemblies of automotive pistons. Numerical simulations have been performed using a 2{1/2}-D particle- in-cell code, which yields time-dependent implantation energy, dose, and angle of arrival for ions at the target surface for realistic geometries. Plasma source development activities include the investigation of pulsed, inductively coupled sources capable of generating highly dissociated N{sup +} with ion densities n{sub i} {approximately} 10{sup 11}/cm{sup 3}, at {approximately}100 W average input power. Cathodic arc sources have also been used to produce filtered metallic and C plasmas for implantation and deposition either in vacuum, or in conjunction with a background gas for production of highly adherent ceramic coatings.

Physical Description

5 p.

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OSTI as DE97001465

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  • 14. international conference on the application of accelerators in research and industry, Denton, TX (United States), 6-9 Nov 1996

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  • Other: DE97001465
  • Report No.: LA-UR--96-3610
  • Report No.: CONF-961110--17
  • Grant Number: W-7405-ENG-36
  • Office of Scientific & Technical Information Report Number: 451751
  • Archival Resource Key: ark:/67531/metadc675206

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  • December 31, 1996

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  • July 25, 2015, 2:21 a.m.

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  • June 24, 2016, 1:27 p.m.

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Munson, C.P.; Faehl, R.J. & Henins, I. Plasma source ion implantation research and applications at Los Alamos National Laboratory, article, December 31, 1996; New Mexico. (digital.library.unt.edu/ark:/67531/metadc675206/: accessed August 17, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.